Imaging and nanofabrication with the helium ion microscope of the van leeuwenhoek laboratory in Delft

Scanning

Volumn 34, Issue 2, 2012, Pages 90-100

  Alkemade, Paul F A ^a   Koster, Emma M ^a   Van Veldhoven, Emile ^b   Maas, Diederik J ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b TNO   (Netherlands)

Author keywords

biological microanalysis; focused ion beam; imaging; ion milling; metrology

Indexed keywords

ACADEMIC RESEARCH; HELIUM ION; HELIUM ION BEAMS; HIGH RESOLUTION; HIGH-RESOLUTION IMAGING; INDUSTRIAL DEVELOPMENT; ION BACKSCATTERING; ION MILLING; NEW APPLICATIONS; NOVEL APPLICATIONS; PRIMARY BEAMS; PROBE SIZE; PROXIMITY EFFECTS; SECONDARY ELECTRONS; SUBNANOMETERS;

FOCUSED ION BEAMS; IMAGING TECHNIQUES; INDUSTRIAL RESEARCH; ION MICROSCOPES; MEASUREMENTS; NANOTECHNOLOGY;

IONS;

HELIUM;

ARTICLE; BIOCHIP; CONTROL SYSTEM; ELECTRON BEAM LITHOGRAPHY; ELECTRON MICROSCOPY; EQUIPMENT DESIGN; EXTREME ULTRAVIOLET RADIATION; HELIUM ION MICROSCOPY; MICROSCOPY; NANOFABRICATION; NANOIMAGING; OPTICAL RESOLUTION; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SCANNING HELIUM ION BEAM LITHOGRAPHY; ULTRAVIOLET RADIATION;

HELIUM; IONS; MICROSCOPY; NANOTECHNOLOGY; NETHERLANDS;

EID: 84860598707     PISSN: 01610457     EISSN: 19328745     Source Type: Journal    
DOI: 10.1002/sca.21009     Document Type: Article

References (34)

1. Alkemade PFA, Chen P, van Veldhoven E, Maas DJ,. 2010. Model for nanopillar growth by focused helium ion-beam-induced deposition. J Vac Sci Technol 28: C6F22-C6F25.
2. Alkemade PFA, van Veldhoven E,. 2011. Deposition, milling, and etching with a focused helium ion beam. In: Stepanova M, Dew S, editors. Nanofabrication: Techniques and principles. New York: Springer. p 275-300.
3. Bell DC, Lemme MC, Stern LA, Marcus CM,. 2009. Precision material modification and patterning with He ions. J Vac Sci Technol B27: 2755-2758.
4. Boden SA, Moktadir Z, Bagnall DM, Mizuta H, Rutt HN,. 2011. Focused helium ion beam milling and deposition. Microelectron Eng 88: 2452-2455.
5. Chen P., 2010. Three-dimensional nanostructures fabricated by ion-beam-induced-deposition. PhD thesis. Delft University of Technology: Delft, The Netherlands.
6. Chen P, van Veldhoven E, Sanford CA, Salemink HWM, Maas DJ, et al. 2010. Nanopillar growth by focused helium ion beam induced deposition. Nanotechnology 21: 455302.
7. Eckstein W., 2007. Sputtering yields. In: Behrisch R, Eckstein W, editors. Sputtering by particle bombardment. Berlin-Heidelberg Germany: Springer. p 33-187.
8. Fowlkes JD, Randolph SJ, Rack PD,. 2005. Growth and simulation of high-aspect ratio nanopillars by primary and secondary electron-induced deposition. J Vac Sci Technol B23: 2825-2832. (Pubitemid 41788765)
9. Franken JH, Hoeijmakers M, Lavrijsen R, Kohlhepp JT, Swagten HJM, et al. 2011. Precise control of domain wall injection and pinning using helium and gallium focused ion beams. J Appl Phys 109: 07D504.
10. Hill R, Notte JA, Ward BW,. 2008. The ALIS He ion source and its application to high resolution microscopy. Phys Proc 1: 135-141.
11. Hill R, Faridur Rahman FHM,. 2011. Advances in helium ion microscopy. Nucl Instr Meth Phys Res A645: 96-101.
12. Knoops HCM, Mackus AJM, Donders ME, van de Sanden MCM, Notten PHL, et al. 2009. Remote plasma ALD of platinum and platinum oxide films. Electrochem Solid State Lett 12: G34-G36.
13. Koster EM., 2011. Helium ion beam induced deposition. BSc thesis (in Dutch). Delft University of Technology: Delft, The Netherlands.
14. Livengood R, Tan S, Greenzweig Y, Notte J, McVey S,. 2009. Subsurface damage from helium ions as a function of dose, beam energy, and dose rate. J Vac Sci Technol B27: 3244-3249.
15. Maas DJ, van Veldhoven E, Chen P, Sidorkin V, Salemink HWM, et al. 2010. Nanofabrication with a helium ion microscope. Proc SPIE 7638: 763814.
16. Maas DJ, van der Drift E, van Veldhoven E, Meessen J, Rudneva MI,. 2011. Nano-engineering with a focused helium ion beam. MRS Proc 1354: ii03-03.
17. Mackus AJM, Mulders JJL, van de Sanden MCM, Kessels WMM,. 2010. Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition. J Appl Phys 107: 116102.
18. Mackus AJM, Kessels WMM, Mulders JJL,. 2011. Selective in-situ atomic layer deposition on structures created with EBID. Micros Analy 25: 6.
19. Melngailis J., 1993. Focused ion beam lithography. Nucl Instrum Meth Phys Res B80: 1271-1280.
20. Petrov Y, Vyvenko O,. 2011. Secondary electron emission spectra and energy selective imaging in helium ion microscope. In: Advanced microscopy technologies for defense, homeland security, forensic, life, environmental, and industrial sciences. Proc SPIE 8036: 80360O.
21. Pickard D, Scipioni L,. 2009. Graphene nano-ribbon patterning in the Orion Plus. Zeiss Application Note, October 2009.
22. Postek MT, Vladár A, Archie C, Ming B,. 2011. Review of current progress in nanometrology with the helium ion microscope. Meas Sci Technol 22: 024004.
23. Ramachandra R, Griffin B, Joy D,. 2009. A model of secondary electron imaging in the helium ion scanning microscope. Ultramicroscopy 109: 748-757.
24. Rudneva MI, van Veldhoven E, Shu MS, Maas DJ, Zandbergen HW,. 2010. Preparation of electron transparent samples of pre-selected areas using a helium ion microscope. In Proceeding 17th International Microscopy Congress, Rio de Janeiro, Brazil, 19-24 September 2010.
25. Sanford CA, Stern L, Barriss L, Farkas L, DiManna M, et al. 2009. Beam induced deposition of platinum using a helium ion microscope. J Vac Sci Technol B27: 2660-2667.
26. Scipioni L, Ferranti DC, Smentkowski VS, Potyrailo RA,. 2010. Fabrication and initial characterization of ultrahigh aspect ratio vias in gold using the helium ion microscope. J Vac Sci Technol B28: C6P18-C6P23.
27. Scipioni L, Sanford CA, van Veldhoven E, Maas DJ,. 2011. A design-of-experiments approach to characterizing beam-induced deposition in the helium ion microscope. Microsc Today 19: 22-26.
28. Sidorkin VA, van Veldhoven E, van der Drift E, Alkemade PFA, Salemink HWM, Maas DJ,. 2009. Sub-10-nm nanolithography with a scanning helium beam. J Vac Sci Technol B27: L18-L20.
29. Seah MP, Dench WA,. 1979. Quantitative electron spectroscopy of surfaces: a standard data base for electron inelastic mean free paths in solids. Surf Interf Anal 1: 2-11. (Pubitemid 10428658)
30. Smith DA, Joy DC, Rack PD,. 2010. Monte Carlo simulation of focused helium ion beam induced deposition. Nanotechnology 21: 175302.
31. Utke I, Hoffmann P, Melngailis J,. 2008. Gas-assisted focused electron beam and ion beam processing and fabrication. J Vac Sci Technol B26: 1197-1276.
32. Van der Drift E, Maas DJ,: 2011. Helium ion lithography. In: Stepanova M, Dew S, editors Nanofabrication: Techniques and principles. New York: Springer. p 93-116.
33. Ward BW, Notte JA, Economou NP,. 2006. Helium ion microscope: A new tool for nanoscale microscopy and metrology. J Vac Sci Technol B24: 2871-2874. (Pubitemid 44866430)
34. Winston D, Cord BM, Ming B, Bell DC, DiNatale WF, et al. 2009. Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist. J Vac Sci Technol B27: 2702-2706.