Advances in ion beam micromachining for complex 3D microfluidics

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 31, Issue 6, 2013, Pages

  Ocola, Leonidas E ^a   Palacios, Edgar ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b University of Illinois at Chicago   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

3-D MICROFLUIDIC; BUFFERED OXIDE ETCH; DEPTH VARIATION; MICRO FLUIDIC SYSTEM; MICRO-FLUIDIC DEVICES; MICROFLUIDIC MIXERS; MIXING LENGTH; THREE-DIMENSIONAL (3D) GEOMETRY;

COMPOSITE MICROMECHANICS; ELECTRON BEAM LITHOGRAPHY; FABRICATION; FLUIDIC DEVICES; INFORMATION MANAGEMENT; ION BEAMS; MICROFLUIDICS; MICROMACHINING; MIXERS (MACHINERY); SERPENTINE;

THREE DIMENSIONAL;

EID: 84890103006     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4819302     Document Type: Article

References (21)

1. K. Kanaya, H. Kawakatsu, S. Matsui, and H. Yamazaki, Optik 21, 399 (1964).
2. I. W. Drummond and J. V. P. Long, Nature 215, 950 (1967). 10.1038/215950a0
3. A. R. Hill, Nature 218, 202 (1968). 10.1038/218202a0
4. R. L. Seliger and W. P. Fleming, J. Vac. Sci. Technol. 10, 1127 (1973). 10.1116/1.1318486
5. R. L. Seliger and W. P. Fleming, J. Appl. Phys. 45, 1416 (1974). 10.1063/1.1663422
6. R. L. Seliger and J. W. Ward, J. Vac. Sci. Technol. 12, 1378 (1975). 10.1116/1.568546
7. R. L. Seliger, J. W. Ward, V. Wang, and R. L. Kubena, Appl. Phys. Lett. 34, 310 (1979). 10.1063/1.90786
8. H. M. Wu, Nanotechnology 24, 175302 (2013). 10.1088/0957-4484/24/17/ 175302
9. A. Imre, L. E. Ocola, L. Rich, and J. Klingfus, J. Vac. Sci. Technol. B 28, 304 (2010). 10.1116/1.3308974
10. E. Palacios, L. E. Ocola, A. Joshi-Imre, S. Bauerdick, M. Berse, and L. Peto, J. Vac. Sci. Technol. B 28, C6I1 (2010). 10.1116/1.3505128
11. D. M. Allen, P. Shore, R. W. Evans, C. Fanara, W. O'Brien, S. Marson, and W. O'Neill, CIRP Ann. 58, 647 (2009). 10.1016/j.cirp.2009.09.007
12. H. Morimoto, Y. Sasaki, K. Saitoh, W. Tatakabe, and T. Kato, Microelectron. Eng. 4, 163 (1986). 10.1016/0167-9317(86)90009-2
13. Y. Liao, Lab Chip 12, 746 (2012). 10.1039/c2lc21015k
14. A. C. Toma, R. Dootz, and T. Pfohl, J. Phys. D: Appl. Phys. 46, 114001 (2013). 10.1088/0022-3727/46/11/114001
15. J. K. Nunes, S. S. H. Tsai, J. Wan, and H. A. Stone, J. Phys. D: Appl. Phys. 46, 114002 (2013). 10.1088/0022-3727/46/11/114002
16. J. B. Knight, A. Vishwanath, J. P. Brody, and R. H. Austin, Phys. Rev. Lett. 80, 3863 (1998). 10.1103/PhysRevLett.80.3863
17. R. H. Liu, M. A. Stremler, K. V. Sharp, M. G. Olsen, J. G. Santiago, and R. J. Adrian, J. Microelectromech. Syst. 9, 190 (2000). 10.1109/84.846699
18. N.-T. Nguyen and Z. Wu, J. Micromech. Microeng. 15, R1 (2005). 10.1088/0960-1317/15/2/R01
19. T. Tofteberg, M. Skolimowski, E. Andreassen, and O. Geschke, Microfluid. Nanofluid. 8, 209 (2010). 10.1007/s10404-009-0456-z
20. M. Holz, S. R. Heil, and A. Sacco, Phys. Chem. Chem. Phys. 2, 4740 (2000). 10.1039/b005319h
21. N.-T. Nguyen and S. T. Wereley, Fundamentals and Applications of Microfluidics (Artech House, Inc., Norwood, 2002).