Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes

Microelectronic Engineering

Volumn 98, Issue , 2012, Pages 198-201

  Nadzeyka, A ^a   Peto, L ^a   Bauerdick, S ^a   Mayer, M ^b   Keskinbora, K ^b   Grevent C ^b   Weigand, M ^b   Hirscher, M ^b   Schutz G ^b  

^a Raith GmbH   (Germany)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

FIB; Fresnel zone plate; Gold; IBL; LMIS; Nano patterning; X ray

Indexed keywords

FIB; FRESNEL ZONE PLATE; IBL; LMIS; NANOPATTERNING;

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; GOLD; INTELLIGENT CONTROL; MILLING (MACHINING); WET ETCHING; X RAY ANALYSIS; X RAYS;

PLATES (STRUCTURAL COMPONENTS);

EID: 84865576611     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2012.07.036     Document Type: Conference Paper

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