Application of the helium ion microscope as a sculpting tool for nanosamples

Materials Research Society Symposium Proceedings

Volumn 1455, Issue , 2012, Pages 61-72

  Rudneva, Maria ^a   Van Veldhoven, Emile ^b   Malladi, Sairam ^a   Maas, Diederik ^b   Zandbergen, Henny W ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM ION MICROSCOPE (HIM); HELIUM ION MICROSCOPES; IN-SITU HEATING; NANOSAMPLES; SAMPLE PREPARATION; SRTIO; THIN METALS; THIN WEDGE;

ELECTRON BEAMS; ION MICROSCOPES;

IONS;

EID: 84879265126     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/opl.2012.1347     Document Type: Conference Paper

References (24)

1. Ward, B. W., Helium ion microscope: A new tool for nanoscale microscopy and metrology. J. Vac. Sci. Technol. B: Microelectronics and Nanometer Structures, 2006. 24(6): p. 2871-2874. (Pubitemid 44866430)
2. Bell, D. C., Contrast Mechanisms and Image Formation in Helium Ion Microscope. Microscopy and Microanalysis, 2009. 15(2): p 147-153.
3. Postek, M. T., et al., Review of current progress in nanometrology with the helium ion microscope. Meas. Sci. Technol., 2011. 22(2).
4. D.J. Maas, E. van der Drift, E. van Veldhoven, J. Meessen, M. Rudneva, and P.F.A. Alkemade, Nano-engineering with a focused helium ion beam, MRS Proceedings (2011), 1354-p33.
5. Sidorkin, V., et al., Sub-10-nm nanolithography with a scanning helium beam, J. Vac. Sci. Technol. B: Microelectronics and Nanometer Structures, 2009. 27(4): p L18-L20.
6. Winston, D., et al., Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist. J. Vac. Sci. Technol. B: Microelectronics and Nanometer Structures, 2009. 27 (6): p. 2702-2706.
7. Maas, D.J., et al., Nanofabrication with a helium ion microscope. SPIE Metrology, Inspection, and Process Control for Microlithography XXIV 2010. 7638: p. 763814.
8. Lemme, M. C., et al., Etching of graphene devices with a helium ion beam. ACS Nano, 2009. 3(9) : p. 2674-2676
9. Yang, J., et al., Rapid and precise scanning helium ion microscope milling of solid-state nanopores for biomolecule detection. Nanotechnology, 2011. 22: p. 285310.
10. Livengood, R., et al., Subsurface damage from helium ions as a function of dose, beam energy, and dose rate. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2009. 27(6): p. 3244-3249.
11. Rue, C., et al., Low keV FIB Applications for Circuit Edit. ISTFA2007 (ASM International 2007): p. 312-318
12. Raineri, V., et al., Radiation damage and implanted He atoms interaction during void formation in silicon, Appl. Phys. Lett, 1997. 71(12)
13. Ziegler, J. F., et al., SRIM - The Stopping and Range of Ions in Matter, (2008). SRIM Co
14. Alkemade, P. F. A et al., Imaging and nanofacrication with the Helium Ion Microscope of the Van Leeuwenhoek Laboratory in Delft, Scanning, 2012. 34(2) p. 90-100
15. van Huis, M. A,. et al., Atomic imaging of phase transitions and morphology transformation in nanocrystals. Adv. Mater, 2009. 21; o 4992-4995
16. da Silva, D., et al., Formation of bubbles and extended defects in He implanted (1 0 0) Si at elevated temperatures. Nuclear Instruments and Methods in Physics Research B, 2004. 219-220: p 713-717.
17. David, M. L., et al., Effect of implant temperature on defects created using high fluence of helium in silicon; J. Appl. Phys. 2003. 93(3): p. 1438.
18. 3. Phys Rev Lett., 2005. 95(22): p. 225506.
19. 3. Phys. Rev. Lett., 2002. 88: p. 075508.
20. Haeni, J. H., et al., Room-temperature ferroelectricity in strained SrTiO3. Nature (London), 2004. 430: p. 758.
21. Rudneva, M., et al., In-situ transmission electron microscopy imaging of electromigration in Pt nanowires. Microscopy and Microanalysis, 2012
22. Gao, B., et al., In situ transmission electron microscopy imaging of grain growth in a platinum nanobridge induced by electric current annealing. Nanotechnology, 2011. 22: p.205705
23. Reutov, V. F., et al., Formation of ordered helium pores in amorphous silicon subjected to low-energy helium ion irradiation. Tech Phys, 2003. 48 (1): p. 73-78.
24. 2. Nuclear Instruments and Methods in Physics Research B, 1994. 91(1-4); p. 362-365.