Large area direct-write focused ion-beam lithography with a dual-beam microscope

Journal of Vacuum Science and Technology B

Volumn 28, Issue 2, 2010, Pages 304-309

  Imre, Alexandra ^a   Ocola, Leonidas E ^a   Rich, Lauren ^b   Klingfus, Joseph ^c  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

^c Raith USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ERRORS;

DIRECT WRITE; DIRECT-WRITE LITHOGRAPHY; DUAL-BEAM MICROSCOPES; FOCUSED ION BEAM LITHOGRAPHIES; FOCUSED IONS BEAMS; IN-FIELD; NM RESOLUTION; PERFORMANCE; STITCHING ERRORS; WRITE FIELD;

FOCUSED ION BEAMS;

EID: 77950590344     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3308974     Document Type: Article

References (6)

1. O. Wilhelmi, S. Reyntjens, C. Mitterbauer, L. Roussel, D. J. Stokes, and D. H. W. Hubert, Jpn. J. Appl. Phys. 0021-4922 47, 5010 (2008). 10.1143/JJAP.47.5010
2. B. I. Prenitzer, C. A. Urbanik-Shannon, L. A. Giannuzzi, S. R. Brown, R. B. Irwin, T. L. Shofner, and F. A. Stevie, Microsc. Microanal. 1431-9276 9, 216 (2003). 10.1017/S1431927603030034 (Pubitemid 36837572)
3. R. M. Langford, P. M. Nellen, J. Gierak, and Y. Yu, MRS Bull. 0883-7694 32, 417 (2007).
4. W. J. MoberlyChan, D. P. Adams, M. J. Aziz, G. Hobler, and T. Schenkel, MRS Bull. 0883-7694 32, 424 (2007).
5. J. Ye, C. N. Berglund, and R. F. W. Pease, J. Vac. Sci. Technol. B 1071-1023 12, 3455 (1994). 10.1116/1.587531
6. F. Watt, A. A. Bettiol, J. A. Van Kan, E. J. Teo, and M. B. H. Breese, Int. J. Nanosci. 0219-581X 4, 269 (2005). 10.1142/S0219581X05003139 (Pubitemid 41041265)