Sub-10-nm nanolithography with a scanning helium beam

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 4, 2009, Pages

  Sidorkin, Vadim ^a   Van Veldhoven, Emile ^b   Van Der Drift, Emile ^a   Alkemade, Paul ^a   Salemink, Huub ^a   Maas, Diederik ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM ION BEAMS; HIGH RESOLUTION; HIGH SENSITIVITY; HYDROGEN SILSESQUIOXANE; PATTERN-DEFINITION TECHNIQUES; PROXIMITY EFFECTS;

HELIUM; HYDROGEN;

SCANNING;

EID: 68349152984     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3182742     Document Type: Article

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