Implications of helium and neon ion beam chemistry for advanced circuit editing

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2013, Pages 118-122

  Wu, H ^a   Ferranti, D ^a   Stern, L A ^a   Xia, D ^a   Phaneuf, M W ^b  

^a CARL ZEISS SMT AG   (Germany)

^b Fibics Incorporated   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84904018000     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

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3. th Int'l Symp for Testing and Failure Analysis, Portland, OR, Nov. 2008, pp 141.
4. th Int'l Symp for Testing and Failure Analysis, Portland, OR, November 2008, pp. 305
5. Ward, B. W. et al., "Helium ion microscope: A new tool for nanoscale microscopy and metrology," J. Vac. Sci. Technol. B, Vol. 24, (2006), pp. 2871-2874. (Pubitemid 44866430)
6. Wu, H. M., et al., "Synthesis of nanowires via helium and neon focused ion beam induced deposition with the gas field ion microscope," Nanotechnology, Vol. 24, (2013), pp. 175302-175305.
7. Wu, H. M. et al., "Focused Helium Ion Beam Deposited Low Resistivity Cobalt Metal Lines with 10nm Resolution: Implications for Advanced Circuit Editing", J. Mater. Sci. Mater. Electron. (2013) in press.
8. Edinger, K. et al., "Study of precursor gases for focused ion beam insulator deposition," J. Vac. Sci. Technol. B, Vol. 16, (1998), pp. 3311-3314. (Pubitemid 128600926)
9. Notte, J. A. "Charged Particle Microscopy: Why Mass Matters," Microscopy Today, Vol. 20, (2012), pp. 16-22.
10. Scipioni, L. et al., "Nano-Pore Milling with the Helium Ion Microscope," White paper of Carl Zeiss, (2010).