Nanomachining with a focused neon beam: A preliminary investigation for semiconductor circuit editing and failure analysis

Journal of Vacuum Science and Technology B

Volumn 29, Issue 6, 2011, Pages

  Tan, Shida ^a   Livengood, Richard ^a   Hack, Paul ^a   Hallstein, Roy ^a   Shima, Darryl ^a   Notte, John ^b   McVey, Shawn ^b  

^a INTEL CORPORATION   (United States)

^b Carl Zeiss Vision Inc USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FAILURE ANALYSIS; ION BEAMS; IONIZATION OF GASES; NEON; SEMICONDUCTOR DEVICES; SILICA; TIMING CIRCUITS; VANADIUM COMPOUNDS;

APPLICATION CAPABILITY; DEVELOPMENT AND APPLICATIONS; DEVICE LAYERS; FOCUSED ION BEAM SOURCES; GAS FIELD IONIZATION SOURCES; SEMICONDUCTOR CIRCUITS; SIO2 THIN FILMS; SUB-SURFACE MATERIALS;

FAILURE (MECHANICAL);

EID: 84255168677     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3660797     Document Type: Article

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