Resolution, masking capability and throughput for direct-write, ion implant mask patterning of diamond surfaces using ion beam lithography

Journal of Micromechanics and Microengineering

Volumn 22, Issue 5, 2012, Pages

  Tripathi, Sarvesh K ^a   Scanlan, Declan ^a,b   O'Hara, Neal ^a,b   Nadzeyka, Achim ^c   Bauerdick, Sven ^c   Peto, Lloyd ^c   Cross, Graham L W ^a,b  

^a TRINITY COLLEGE DUBLIN   (Ireland)

^b Adama Innovations Ltd   (Ireland)

^c Raith GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIAMOND SURFACES; DIRECT WRITE; HARD MASKS; HIGH ASPECT RATIO; HIGH RESOLUTION; HIGH-RESOLUTION PATTERNS; IMPLANTED REGION; INDUSTRIAL-SCALE APPLICATIONS; ION IMPLANT; LOW DOSE; MASK PATTERNING; NANOPATTERNING; TOP SURFACE IMAGING;

ASPECT RATIO; IONS; LITHOGRAPHY; PLASMA ETCHING; SEMICONDUCTOR DOPING;

SYNTHETIC DIAMONDS;

EID: 84859258169     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/22/5/055005     Document Type: Article

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