Dry fabrication of microdevices by the combination of focused ion beam and cryogenic deep reactive ion etching

Journal of Micromechanics and Microengineering

Volumn 20, Issue 8, 2010, Pages

  Chekurov, N ^a   Grigoras, K ^a   Sainiemi, L ^a   Peltonen, A ^a   Tittonen, I ^a   Franssila, S ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

3D STRUCTURE; DEEP REACTIVE ION ETCHING; DOUBLE-ENDED TUNING FORKS; ELECTRICAL MEASUREMENT; FIB MILLING; MASK DESIGN; MICRO DEVICES; MICRO-DEVICE FABRICATION; MICROELECTROMECHANICAL SYSTEMS; NANO-DEVICES; NANO-FABRICATION METHODS; PROCESS TIME; THIN SURFACE LAYER; WRITING SPEED;

CRYOGENICS; FABRICATION; FOCUSED ION BEAMS; IONS; MEMS; MICROELECTROMECHANICAL DEVICES; PORTABLE EQUIPMENT;

REACTIVE ION ETCHING;

EID: 77957835619     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/8/085009     Document Type: Article

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