Subsurface damage from helium ions as a function of dose, beam energy, and dose rate

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 3244-3249

  Livengood, Richard ^a   Tan, Shida ^a   Greenzweig, Yuval ^a   Notte, John ^b   McVey, Shawn ^b  

^a INTEL CORPORATION   (United States)

^b Carl Zeiss Vision Inc USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM ENERGIES; CONTRAST MECHANISM; DOSE RATE; HELIUM ION; HIGH RESOLUTION IMAGE; OPERATING REGIMES; POTENTIAL APPLICATIONS; SUB-SURFACE DAMAGE;

HELIUM;

IONS;

EID: 72849144335     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3237101     Document Type: Conference Paper

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