Probe current distribution characterization technique for focused ion beam

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 30, Issue 6, 2012, Pages

  Tan, Shida ^a   Livengood, Richard ^a   Greenzweig, Yuval ^a   Drezner, Yariv ^a   Shima, Darryl ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PROFILES; BEAM SPOT; BIOLOGICAL SCIENCE; CHARACTERIZATION TECHNIQUES; COMPREHENSIVE ANALYSIS; FINE TUNING; FOCUSED ION BEAM TECHNOLOGY; MACHINING PRECISION; PROBE CURRENTS; RESOLUTION ANALYSIS; SEMICONDUCTOR PROCESS;

ELECTRIC CURRENT DISTRIBUTION MEASUREMENT; FOCUSED ION BEAMS; IMAGE RESOLUTION;

PROBES;

EID: 84870364244     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4766882     Document Type: Article

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