Micromachining using focused high energy ion beams: Deep Ion Beam Lithography

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 148, Issue 1-4, 1999, Pages 1085-1089

  Van Kan, J A ^a   Sanchez, J L ^a   Xu, B ^b   Osipowicz, T ^a   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

High aspect ratio; Micromachining; Nuclear microscope

Indexed keywords

ASPECT RATIO; ELECTROFORMING; MASKS; MICROMACHINING; MICROSTRUCTURE; MULTILAYERS; PHOTORESISTS; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

DEEP ION BEAM LITHOGRAPHY (DIBL);

ION BEAM LITHOGRAPHY;

EID: 0033513684     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)90667-X     Document Type: Article

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