GaN focused ion beam micromachining with gas-assisted etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2547-2550

  Chyr, I ^a   Steckl, A J ^a  

^a University of Cincinnati   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; GALLIUM NITRIDE; GASES; ION IMPLANTATION; MICROMACHINING; PLASMA ETCHING;

GAS ASSISTED DEPOSITION; GAS ASSISTED ETCHING; ION BEAM MICROMACHINING;

ION BEAM ASSISTED DEPOSITION;

EID: 0035519773     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1417550     Document Type: Article

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