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Advanced Materials

Volumn 26, Issue 25, 2014, Pages 4386-4396

Three-dimensional nanofabrication by block copolymer self-assembly

(5) Ross, Caroline A a Berggren, Karl K b Cheng, Joy Y c Jung, Yeon Sik d Chang, Jae Byum a

a Massachusetts Institute of Technology Cambridge (United States)

b Department of Electrical Engineering and Computer Science (United States)

c IBM ALMADEN RESEARCH CENTER (United States)

d Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

block copolymer; nanofabrication; nanolithography

Indexed keywords

MICROPHASE SEPARATION; NANOLITHOGRAPHY; NANOTECHNOLOGY; SELF ASSEMBLY; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DEVICES;

3D NANOFABRICATION; BLOCK COPOLYMER SELF-ASSEMBLY; HETEROGENEOUS STRUCTURES; MICRO-DOMAINS; NANO-SCALE FABRICATION; RECENT PROGRESS; THREE DIMENSIONAL NANOFABRICATION; THREE-DIMENSIONAL STRUCTURE;

BLOCK COPOLYMERS;

EID: 84903730346 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201400386 Document Type: Article

Times cited : (157)

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