Epitaxial graphene nanoribbon array fabrication using BCP-assisted nanolithography

ACS Nano

Volumn 6, Issue 8, 2012, Pages 6786-6792

  Liu, Guanxiong ^a,b   Wu, Yanqing ^a   Lin, Yu Ming ^a   Farmer, Damon B ^a   Ott, John A ^a   Bruley, John ^a   Grill, Alfred ^a   Avouris, Phaedon ^a   Pfeiffer, Dirk ^a   Balandin, Alexander A ^b   Dimitrakopoulos, Christos ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b University of California Riverside ^*  (United States)

Author keywords

block copolymer; epitaxial graphene; nanolithography; nanoribbon; SiC

Indexed keywords

ARRAY FABRICATION; ARRAY STRUCTURES; DEFECT COUNTS; EPITAXIAL GRAPHENE; ETCHING MASKS; GRAPHENE NANO-RIBBON; NANORIBBONS; SELF-ASSEMBLED PATTERNS; SIC; TOPDOWN; WAFER SCALE;

BLOCK COPOLYMERS; FABRICATION; GRAPHENE; NANOLITHOGRAPHY; NANOSTRUCTURES; SELF ASSEMBLY; SILICON CARBIDE;

EPITAXIAL GROWTH;

GRAPHITE; INORGANIC COMPOUND; NANOMATERIAL; SILICON CARBIDE; SILICON DERIVATIVE;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; MOLECULAR IMPRINTING; PARTICLE SIZE; PHOTOGRAPHY; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

CARBON COMPOUNDS, INORGANIC; CRYSTALLIZATION; GRAPHITE; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; MOLECULAR IMPRINTING; NANOSTRUCTURES; PARTICLE SIZE; PHOTOGRAPHY; SILICON COMPOUNDS; SURFACE PROPERTIES;

EID: 84865576217     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn301515a     Document Type: Article

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