Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  Liu, Chi Chun ^a   Pitera, Jed ^a   Lafferty, Neal ^b   Lai, Kafai ^b   Rettner, Charles ^a   Tjio, Melia ^a   Arellano, Noel ^a   Cheng, Joy ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM MICROELECTRONICS   (United States)

Author keywords

BCP; block copolymer; Directed self assembly; DSA; fast model; OPC

Indexed keywords

BLOCK COPOLYMERS; MONTE CARLO METHODS; PHOTOLITHOGRAPHY; SELF ASSEMBLY;

BCP; DIRECTED SELF-ASSEMBLY; DSA; FAST MODEL; OPC;

COMPUTER SIMULATION;

EID: 84878395529     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.916525     Document Type: Conference Paper

References (8)

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