Directed self-assembly of block copolymers

Current Opinion in Chemical Engineering

Volumn 2, Issue 1, 2013, Pages 88-94

  Takenaka, Mikihito ^a   Hasegawa, Hirokazu ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS;

CONVENTIONAL PHOTOLITHOGRAPHY; DIRECTED SELF-ASSEMBLY; ETCHING MASKS; GRAPHOEPITAXY; MICRO-DOMAINS; NANOPROCESSING; RESOLUTION LIMITS; SELF-ASSEMBLE;

SELF ASSEMBLY;

EID: 84875254853     PISSN: None     EISSN: 22113398     Source Type: Journal    
DOI: 10.1016/j.coche.2012.10.008     Document Type: Review

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