Conformable solid-index phase masks composed of high-aspect-ratio micropillar arrays and their application to 3D nanopatterning

Advanced Materials

Volumn 23, Issue 7, 2011, Pages 860-864

  Park, Junyong ^a   Park, Jae Hong ^b   Kim, Eunhye ^a   Ahn, Chi Won ^b   Jang, Hyun Ik ^b   Rogers, John A ^c   Jeon, Seokwoo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b National Nano Fab Center (NNFC)   (South Korea)

^c UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

3D nanopatterning; micropillar arrays; nanostructures; optical coatings; phase masks

Indexed keywords

DEFECT-FREE; HIGH ASPECT RATIO; HIGH RESOLUTION; MICRO PILLARS; NANOPATTERNING; PHASE MASKS; POLYURETHANE ACRYLATES; PROXIMITY FIELD NANOPATTERNING; SINGLE EXPOSURE;

ASPECT RATIO; NANOSTRUCTURES; OPTICAL COATINGS; THREE DIMENSIONAL;

OPTICAL PROPERTIES;

BAYSILON; DIMETICONE; NANOMATERIAL; POLYURETHAN; SILICON;

ARTICLE; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY;

DIMETHYLPOLYSILOXANES; NANOSTRUCTURES; NANOTECHNOLOGY; POLYURETHANES; SILICON;

EID: 79951742413     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201003885     Document Type: Article

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