Highly ordered freestanding titanium oxide nanotube arrays using Si-containing block copolymer lithography and atomic layer deposition

Nanotechnology

Volumn 24, Issue 8, 2013, Pages

  Ku, Se Jin ^a   Jo, Gyeong Cheon ^a   Bak, Chang Hong ^a   Kim, Su Min ^a   Shin, Yu Ri ^b   Kim, Kwang Ho ^b   Kwon, Se Hun ^b   Kim, Jin Baek ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Pusan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE TIO; ATOMIC LAYER CONTROL; BLOCK COPOLYMER FILMS; BLOCK COPOLYMER LITHOGRAPHY; CONTROLLED THICKNESS; CYLINDRICAL NANOPORES; DRY-ETCH; HIGH ASPECT RATIO; HIGH TEMPERATURE; INNER SURFACES; MULTICOMPONENTS; NANOLAMINATE; NANOPOROUS TEMPLATES; NANOTUBE ARRAYS; ORGANIC-INORGANIC HYBRID; PATTERN TRANSFERS; TIO; TITANIUM OXIDE NANOTUBES; TUNABILITIES; ULTRAFINE; VERTICALLY ALIGNED; WALL THICKNESS;

ALUMINUM; ASPECT RATIO; BLOCK COPOLYMERS; CALCINATION; DEPOSITION; FABRICATION; MESOPOROUS MATERIALS; NANOPORES; NANOTUBES; ORGANIC POLYMERS; TITANIUM; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84873436013     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/8/085301     Document Type: Article

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