SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 24, Issue 10, 2012, Pages

Ultrafast polymerization inhibition by stimulated emission depletion for three-dimensional nanolithography

(2) Fischer, Joachim a Wegener, Martin a,b

a KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

b KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

Author keywords

3D lithography; direct laser writing; nanofabrication; stimulated emission depletion; superresolution

Indexed keywords

3D LITHOGRAPHY; DEPLETION MECHANISM; DIRECT LASER WRITING; PHOTO-INITIATOR; PULSED EXCITATION; STIMULATED EMISSION DEPLETION; SUPER RESOLUTION; ULTRA-FAST;

NANOTECHNOLOGY; PHOTORESISTS;

THREE DIMENSIONAL;

ARTICLE; KINETICS; LIGHT RELATED PHENOMENA; METHODOLOGY; NANOTECHNOLOGY; POLYMERIZATION; PRINTING;

KINETICS; NANOTECHNOLOGY; OPTICAL PROCESSES; POLYMERIZATION; PRINTING;

EID: 84858042612 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201103758 Document Type: Article

Times cited : (52)

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