SCOPUS 정보 검색 플랫폼

Volumn 10, Issue 4, 2014, Pages 725-733

In situ electron microscopy four-point electromechanical characterization of freestanding metallic and semiconducting nanowires

(7) Bernal, Rodrigo A a Filleter, Tobin a,b Connell, Justin G a Sohn, Kwonnam a Huang, Jiaxing a Lauhon, Lincoln J a Espinosa, Horacio D a

a Northwestern University (United States)

b UNIVERSITY OF TORONTO (Canada)

Author keywords

electromechanical properties; Four point measurements; in situ testing; MEMS; nanowire piezoresistance

Indexed keywords

EID: 84894253596 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.201300736 Document Type: Article

Times cited : (41)

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