Atmospheric pressure plasma jet annealed ZnO films for MgZnO/ZnO heterojunctions

Journal of Physics D: Applied Physics

Volumn 46, Issue 8, 2013, Pages

  Lien, Shao Tzu ^a   Li, Hsin Chieh ^b   Yang, Yao Jhen ^b   Hsu, Cheng Che ^b   Cheng, I Chun ^b   Chen, Jian Zhang ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA JETS; CRITICAL STEPS; CRYSTALLINITIES; PLASMA REACTIVITY; PROCESSING TIME; THERMAL ANNEALS; TRANSMISSION MEASUREMENTS; TREATMENT TIME; XRD; ZNO; ZNO FILMS;

ELECTRON GAS; METALLIC FILMS; PLASMA DIAGNOSTICS; PLASMA JETS; ZINC OXIDE;

HETEROJUNCTIONS;

EID: 84873649454     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/46/7/075202     Document Type: Article

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