Downstream characterization of an atmospheric pressure pulsed arc jet

Plasma Chemistry and Plasma Processing

Volumn 30, Issue 3, 2010, Pages 363-372

  Hsu, Yao Wen ^a   Yang, Yao Jhen ^a   Wu, Cheng Yi ^a   Hsu, Cheng Che ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Atmospheric pressure plasma jet; Downstream characterization

Indexed keywords

AFTERGLOW CHARACTERISTICS; APPLIED VOLTAGES; ATMOSPHERIC PRESSURE PLASMA JET; ATMOSPHERIC PRESSURE PLASMA JETS; DECAY PROCESS; GAS FLOWRATE; JET TEMPERATURE; OPTICAL EMISSION SPECTROMETER; PLASMA CHARACTERISTICS; PLASMA REACTIVITY; POWER DENSITIES; POWER DEPOSITION; PROCESS PARAMETERS; PULSED ARC; PULSED DC POWER; REACTIVE SPECIES;

AERODYNAMICS; ATMOSPHERIC PRESSURE; ATMOSPHERICS; DC POWER TRANSMISSION; FLOW OF GASES; PLASMA ACCELERATORS; PLASMA DEPOSITION; PLASMA JETS; PLASMA SOURCES; THERMOCOUPLES;

NITROGEN PLASMA;

EID: 77953611352     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-010-9224-9     Document Type: Article

References (31)

1. Foest R, Kindel E, Ohl A, Stieber M, Weltmann KD (2005) Plasma Phys. Control Fusion 47:B525-B536
2. Babayan SE, Jeong JY, Schutze A, Tu VJ, Moravej M, Selwyn GS, Hicks RF (2001) Plasma Sources Sci Technol 10:573-578
3. Hong YC, Uhm HS (2006) Chem Phys Lett 422:174-178
4. Roth JR, Nourgostar S, Bonds TA (2007) IEEE Trans Plasma Sci 35:233-250
5. Akishev Y, Grushin M, Kochetov I, Karal'nik V, Napartovich A, Trushkin N (2004) Plasma Sources Sci Technol 14:S18-S25
6. Eliasson B, Kogelschatz U (1991) IEEE Trans Plasma Sci 19:1063-1077
7. Massines F, Rabehi A, Decomps P, Gadri RB, Segur P, Mayoux C (1998) J Appl Phys 83:2950-2957
8. Fridman A, Nester S, Kennedy LA, Saveliev A, Mutaf-Yardimci O (1999) Prog Energy Combustion Sci 25:211-231
9. Uhm HS, Hong YC, Shin DH (2006) Plasma Sources Sci Technol 15:S26-S34
10. Laroussi M, Akan T (2007) Plasma Process Polym 4:777-788
11. Schutze A, Jeong JY, Babayan SE, Park J, Selwyn GS, Hicks RF (1998) IEEE Trans Plasma Sci 26:1685-1694
12. Babayan SE, Ding G, Hicks RF (2001) Plasma Chem Plasma Process 21:505-521
13. Moravej M, Yang X, Barankin M, Penelon J, Babayan SE, Hicks RF (2006) Plasma Sources Sci Technol 15:204-210
14. Chen GL, Chen SH, Zhou MY, Feng WR, Gu WC, Yang SZ (2006) Plasma Sources Sci Technol 15:603-608
15. Forster S, Mohr C, Viol W (2005) Surf Coat Technol 200:827-830
16. Foest R, Kindel E, Lange H, Ohl A, Stieber M, Weltmann KD (2007) Contrib Plasma Phys 47:119-128
17. Hsu CC, Wu CY (2009) J Phys D-Appl Phys 42:215202
18. Hsu CC, Wu CY, Chen CW, Cheng WC (2009) Jpn J Appl Phys 48:076002
19. Hsu CC, Yang YJ (2010) IEEE Trans Plasma Sci 38:496-499
20. Bayes KD, Kistiakowsky GB (1960) J Chem Phys 32:992-1000
21. Kossyi IA, Kostinsky AY, Matveyev AA, Silakov VP (1992) Plasma Sources Sci Technol 1:207-220
22. Wright AN, Wrinkler CA (1968) Active nitrogen. Academic Press Inc, New York
23. Choi YH, Kim JH, Hwang YS (2006) Thin Solid Films 506-507:389-395
24. Babayan SE, Ding G, Nowling GR, Yang X, Hicks RF (2002) Plasma Chem Plasma Process 22:255-269
25. Hsu CC, Titus MJ, Graves DB (2007) J Vac Sci Technol 25:607-614
26. Titus MJ, Hsu CC, Graves DB (2009) J Vac Sci Technol 28:139-146
27. Bird RB, Stewart WE, Lightfoot EN (2002) Transport phenomena. Wiley, New York
28. Huang C, Hsu WT, Liu CH, Wu SY, Yang SH, Chen TH, Wei TC (2009) IEEE Trans Plasma Sci 37:1127-1128
29. Duan YX, Huang C, Yu QS (2005) IEEE Trans Plasma Sci 33:328-329
30. Laroussi M, Lu X (2005) Appl Phys Lett 87:113902
31. Yang XW, Moravej M, Nowling GR, Chang JP, Hicks RF (2005) IEEE Trans Plasma Sci 33:294-295