The structural and optical properties of ZnO/Si thin films by RTA treatments

Applied Surface Science

Volumn 254, Issue 6, 2008, Pages 1578-1582

  Hu, S Y ^a   Lee, Y C ^b   Lee, J W ^b   Huang, J C ^b   Shen, J L ^c   Water, W ^d  

^a Department of Electrical Engineering   (Taiwan)

^b TUNGNAN UNIVERSITY   (Taiwan)

^c CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

^d NATIONAL FORMOSA UNIVERSITY   (Taiwan)

Author keywords

Photoluminescence; Rapid thermal annealing; ZnO thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; PHOTOLUMINESCENCE; RAPID THERMAL ANNEALING; X RAY DIFFRACTION; ZINC OXIDE;

CRYSTALLINE QUALITY; EFFECTIVE RELAXATION; EMISSION INTENSITY; RESIDUAL COMPRESSIVE STRESS;

THIN FILMS;

EID: 37449016724     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.07.134     Document Type: Article

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