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Thin Solid Films

Volumn 519, Issue 10, 2011, Pages 3095-3099

Deposition of zinc oxide thin films by an atmospheric pressure plasma jet

(4) Hsu, Yao Wen a Li, Hsin Chieh a Yang, Yao Jhen a Hsu, Cheng Che a

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

Arc jet; Atmospheric pressure plasma jet; Large area deposition; Nitrogen plasma; Thin film deposition; Zinc oxide

Indexed keywords

ARC JET; ATMOSPHERIC PRESSURE PLASMA JETS; CONTINUOUS PROCESSING; DEPOSITED FILMS; FAST DEPOSITION; HEXAGONAL WURTZITE STRUCTURE; LARGE AREA DEPOSITION; LARGER SUBSTRATES; PROCESS CAPABILITIES; ROOT MEAN SQUARE; THIN FILM DEPOSITION; THIN-FILM DEPOSITIONS; ZINC OXIDE THIN FILMS; ZNO FILMS; ZNO THIN FILM;

ATMOSPHERIC PRESSURE; ATMOSPHERICS; ATOMIC FORCE MICROSCOPY; DEPOSITION RATES; METALLIC FILMS; NITROGEN; NITROGEN PLASMA; OPTICAL FILMS; OXIDE FILMS; PLASMA ACCELERATORS; PLASMA DEPOSITION; PLASMA JETS; PLASMA SOURCES; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE; ZINC SULFIDE;

DEPOSITION;

EID: 79952317666 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.12.156 Document Type: Article

Times cited : (52)

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