Preparation of ZnO films from Zn2+ aqueous mist using atmospheric pressure glow plasma

Journal of Materials Science Letters

Volumn 20, Issue 5, 2001, Pages 481-484

  Maruyama, K ^a   Tsumagari, I ^a   Kanezawa, M ^a   Gunji, Y ^a   Morita, M ^a   Kogoma, M ^b   Okazaki, S ^b  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^b SOPHIA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CRYSTAL STRUCTURE; FILM PREPARATION; FOG; MORPHOLOGY; NUMERICAL METHODS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACES; THICKNESS MEASUREMENT; ZINC;

AQUEOUS MIST; ATMOSPHERIC PRESSURE GLOW PLASMA;

ZINC OXIDE;

EID: 0035961143     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1010901303209     Document Type: Article

References (11)