Pulsed-laser deposited ZnO for device applications

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 811-818

  King, Simon L ^a   Gardeniers, J G E ^b   Boyd, Ian W ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; DEPOSITION; PIEZOELECTRIC DEVICES; PULSED LASER APPLICATIONS; SENSORS; SPECTROPHOTOMETRY; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

DEPOSITION RATE; DEPOSITION TEMPERATURE; FULL WIDTH HALF MAXIMA; PIEZOELECTRIC ACTUATORS; PULSE LASER DEPOSITION;

FILM GROWTH;

EID: 0030562945     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)80027-4     Document Type: Article

References (24)

1. O. Madelung, Ed., Landolt-Bornstein (New Series), Vol. 17b (Springer, New York, 1982).
2. Y. Xu, Ferroelectric Materials (North-Holland, Amsterdam, 1991).
3. W-C. Shih and M-S. Wu, J. Cryst, Growth 137 (1994) 319.
4. R.G. Heideman, P.V. Lambeck and J.G.E. Gardeniers, Opt. Mater. 4 (1995) 741.
5. D.H. Zhang and D.E. Brodie, Thin Solid Films 238 (1994) 95.
6. R. Littbarski, Curr. Top. Mater. Sci. 7 (1981) 213.
7. H. Sato, T. Minami and S. Takata, J. Vac. Sci. Technol. A 11 (1993) 2975.
8. H. Sankur and J.T. Cheung, J. Vac. Sci. Technol. A 1 (1983) 1806.
9. J.T. Cheung and S.R. Johnson, Aerospace Eng. 14 (1994) 7.
10. S.L. King, L. Coccia and I.W. Boyd, Appl. Surf. Sci. 86 (1995) 134.
11. V. Craciun, S. Amirhaghi, D. Craciun, J. Elders, J.G.E. Gardeniers and I.W. Boyd, Appl. Surf. Sci. 86 (1995) 99.
12. S. Amirhaghi, V. Craciun, D. Craciun, J. Elders and I.W. Boyd, Microelectron. Eng. 25 (1994) 321.
13. N.J. Ianno, L. McConville, N. Shaikh, S. Pittal and P.O. Snyder, Thin Solid Films 220 (1992) 92.
14. H.K. Kim and M. Mathur, J. Elect. Mater. 22 (1993) 267.
15. D. Louer and J.I. Langford, J. Appl. Cryst. 21 (1988) 430.
16. E.P. Donovan, J.S. Horowitz, C.A. Carosella, R.C.Y. Auyeung, D.B. Chrisey and J.G. Smits, Mater. Res. Soc. Symp. Proc. 360 (1995) 395.
17. M. Ogasawara, M. Shimizu and T. Shiosaki, Jpn. J. Appl. Phys. 31 (1992) 2971.
18. T. Shiosaki and A. Kawabata, Ferroelectrics 42 (1982) 219.
19. M. Kadota, T. Kasanami and M. Minakata, Jpn. J. Appl. Phys. 31 (1992) 3013.
20. L-J. Meng, M. Andritschky and M.P. dos Santos, Vacuum 44 (1993) 105.
21. D.H. Zhang and D.E. Brodie, Thin Solid Films 238 (1994) 95.
22. Y. Igasaki and H. Saito, J. Appl. Phys. 70 (1991) 3613; ibid. 69 (1991) 2190.
23. Y. Igasaki and H. Saito, J. Appl. Phys. 70 (1991) 3613; ibid. 69 (1991) 2190.
24. A. Cimino, G. Mazzone and P. Porta, Z. Phys. Chem. (NF) 41 (1964) 154.