SCOPUS 정보 검색 플랫폼

Volumn 51, Issue 6 PART 2, 2012, Pages

Optimized multigrid strategy for accurate flare modeling with three-dimensional mask effect in extreme-ultraviolet lithography

(6) Lee, Junhwan a Lee, Sangheon a Kim, Changreol b Kim, Yongdae b Kim, Sangpyo b Kim, Ohyun a

a Pohang University of Science and Technology (POSTECH) (South Korea)

b Hynix Semiconductor Inc (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBER MATERIAL; CRITICAL CHALLENGES; CRITICAL DIMENSION; DEFOCUS; EUV MASK; EXTREME ULTRAVIOLETS; FULL-FIELD; ILLUMINATION ANGLE; IMAGING PERFORMANCE; MASK PATTERNS; MULTI-GRID; PATTERN DENSITY; RULE-BASED METHOD; SEMICONDUCTOR INDUSTRY; TECHNOLOGY NODES; WAFER LEVEL;

EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS; OPTIMIZATION; SEMICONDUCTOR DEVICE MANUFACTURE;

THREE DIMENSIONAL;

EID: 84863321278 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.51.06FB06 Document Type: Article

Times cited : (12)

References (33)

1
- 36248985129
- R. Jonckheere, G. F. Lorusso, A. M. Goethals, J. Hermans, B. Baudemprez, A. Myers, I. Kim, A. Niroomand, F. Iwamoto, N. Stepanenko, and K. Ronse: Proc. SPIE 6607 (2007) 66070H.
- (2007) Proc. SPIE , vol.6607
- Jonckheere, R.¹ Lorusso, G.F.² Goethals, A.M.³ Hermans, J.⁴ Baudemprez, B.⁵ Myers, A.⁶ Kim, I.⁷ Niroomand, A.⁸ Iwamoto, F.⁹ Stepanenko, N.¹⁰ Ronse, K.¹¹

2
- 35148888641
- N. Harned, M. Goethals, R. Groeneveld, P. Kucrz, M. Lowisch, H. Meijer, H. Meiling, K. Ronse, J. Ryan, M. Tittnich, H. J. Voorma, J. Zimmerman, U. Mickan, and S. Lok: Proc. SPIE 6517 (2007) 651706.
- (2007) Proc. SPIE , vol.6517 , pp. 651706
- Harned, N.¹ Goethals, M.² Groeneveld, R.³ Kucrz, P.⁴ Lowisch, M.⁵ Meijer, H.⁶ Meiling, H.⁷ Ronse, K.⁸ Ryan, J.⁹ Tittnich, M.¹⁰ Voorma, H.J.¹¹ Zimmerman, J.¹² Mickan, U.¹³ Lok, S.¹⁴

3
- 0036380264
- P. Yan: Proc. SPIE 4688 (2002) 150.
- (2002) Proc. SPIE , vol.4688 , pp. 150
- Yan, P.¹

4
- 38849199818
- H. Aoyama, N. Iriki, and T. Tanaka: J. Vac. Sci. Technol. B 26 (2008) 80.
- (2008) J. Vac. Sci. Technol. B , vol.26 , pp. 80
- Aoyama, H.¹ Iriki, N.² Tanaka, T.³

5
- 85076473652
- J. P. Kirk: Proc. SPIE 2197 (1994) 566.
- (1994) Proc. SPIE , vol.2197 , pp. 566
- Kirk, J.P.¹

6
- 0036381345
- C. Krautschik, M. Ito, I. Nishiyama, and S. Okazaki: Proc. SPIE 4688 (2002) 289.
- (2002) Proc. SPIE , vol.4688 , pp. 289
- Krautschik, C.¹ Ito, M.² Nishiyama, I.³ Okazaki, S.⁴

7
- 79957940348
- C. Zuniga, M. Habib, J. Word, G. F. Lorusso, E. Hendrickx, B. Baylav, R. Chalasani, and M. Lam: Proc. SPIE 7969 (2011) 79690T.
- (2011) Proc. SPIE , vol.7969
- Zuniga, C.¹ Habib, M.² Word, J.³ Lorusso, G.F.⁴ Hendrickx, E.⁵ Baylav, B.⁶ Chalasani, R.⁷ Lam, M.⁸

8
- 13244299674
- M. Chandhok, S. H. Lee, and T. Bacuita: J. Vac. Sci. Technol. B 22 (2004) 2966.
- (2004) J. Vac. Sci. Technol. B , vol.22 , pp. 2966
- Chandhok, M.¹ Lee, S.H.² Bacuita, T.³

9
- 67149127143
- J. Moon, C. K. Kim, B. S. Nam, B. H. Nam, Y. S. Hyun, S. K. Kim, C. M. Lim, Y. D. Kim, M. S. Kim, Y. K. Choi, C. R. Kim, and D. Yim: Proc. SPIE 7271 (2009) 727144.
- (2009) Proc. SPIE , vol.7271 , pp. 727144
- Moon, J.¹ Kim, C.K.² Nam, B.S.³ Nam, B.H.⁴ Hyun, Y.S.⁵ Kim, S.K.⁶ Lim, C.M.⁷ Kim, Y.D.⁸ Kim, M.S.⁹ Choi, Y.K.¹⁰ Kim, C.R.¹¹ Yim, D.¹²

10
- 35148825532
- A. M. Goethals, R. Jonckheere, G. F. Lorusso, J. Hermans, F. V. Roey, A. Myers, M. Chandhok, I. Kim, A. Niroomand, F. Iwamoto, N. Stepanenko, R. Gronheid, B. Baudemprez, and K. Ronse: Proc. SPIE 6517 (2007) 651709.
- (2007) Proc. SPIE , vol.6517 , pp. 651709
- Goethals, A.M.¹ Jonckheere, R.² Lorusso, G.F.³ Hermans, J.⁴ Roey, F.V.⁵ Myers, A.⁶ Chandhok, M.⁷ Kim, I.⁸ Niroomand, A.⁹ Iwamoto, F.¹⁰ Stepanenko, N.¹¹ Gronheid, R.¹² Baudemprez, B.¹³ Ronse, K.¹⁴

11
- 35148870833
- O. R. Wood III, D. Back, R. Brainard, G. Denbeaux, D. Goldfarb, F. Goodwin, J. Hartley, K. Kimmel, C. Koay, B. La Fontaine, J. Mackey, B. Martinick, W. Montgomery, P. Naulleau, U. Okoroanyanwu, K. Petrillo, B. Pierson, M. Tittnich, S. Trogisch, T. Wallow, and Y. Wei: Proc. SPIE 6517 (2007) 65170U.
- (2007) Proc. SPIE , vol.6517
- Wood III, O.R.¹ Back, D.² Brainard, R.³ Denbeaux, G.⁴ Goldfarb, D.⁵ Goodwin, F.⁶ Hartley, J.⁷ Kimmel, K.⁸ Koay, C.⁹ La Fontaine, B.¹⁰ Mackey, J.¹¹ Martinick, B.¹² Montgomery, W.¹³ Naulleau, P.¹⁴ Okoroanyanwu, U.¹⁵ Petrillo, K.¹⁶ Pierson, B.¹⁷ Tittnich, M.¹⁸ Trogisch, S.¹⁹ Wallow, T.²⁰ Wei, Y.²¹ more..

12
- 67149101478
- H. Mizuno, G. McIntyre, C. Koay, M. Burkhardt, B. La Fontaine, and O. Wood: Proc. SPIE 7271 (2009) 72710U.
- (2009) Proc. SPIE , vol.7271
- Mizuno, H.¹ McIntyre, G.² Koay, C.³ Burkhardt, M.⁴ La Fontaine, B.⁵ Wood, O.⁶

13
- 77953440732
- J. V. Hermans, E. Hendrickx, D. Laidler, C. Jehoul, D. V. D. Heuvel, and A. Goethals: Proc. SPIE 7636 (2010) 76361L.
- (2010) Proc. SPIE , vol.7636
- Hermans, J.V.¹ Hendrickx, E.² Laidler, D.³ Jehoul, C.⁴ Heuvel, D.V.D.⁵ Goethals, A.⁶

14
- 84863330072
- E. S. Putna, T. R. Younkin, R. Caudillo, and M. Chandhok: Proc. SPIE 7636 (2010) 79360P.
- (2010) Proc. SPIE , vol.7636
- Putna, E.S.¹ Younkin, T.R.² Caudillo, R.³ Chandhok, M.⁴

15
- 37149034956
- G. F. Lorusso, A. M. Goethals, R. Jonckheere, J. Hermans, K. Ronse, A. M. Myers, I. Kim, A. Niroomand, F. Iwamoto, and D. Ritter: J. Vac. Sci. Technol. B 25 (2007) 2127.
- (2007) J. Vac. Sci. Technol. B , vol.25 , pp. 2127
- Lorusso, G.F.¹ Goethals, A.M.² Jonckheere, R.³ Hermans, J.⁴ Ronse, K.⁵ Myers, A.M.⁶ Kim, I.⁷ Niroomand, A.⁸ Iwamoto, F.⁹ Ritter, D.¹⁰

16
- 77953475336
- M. Shiraishi, T. Oshino, K. Murakami, and H. Chiba: Proc. SPIE 7636 (2010) 763629.
- (2010) Proc. SPIE , vol.7636 , pp. 763629
- Shiraishi, M.¹ Oshino, T.² Murakami, K.³ Chiba, H.⁴

17
- 77955322264
- H. Aoyama, Y. Tanaka, K. Tawarayama, Y. Arisawa, T. Tanaka, and I. Mori: Jpn. J. Appl. Phys. 48 (2009) 056510.
- (2009) Jpn. J. Appl. Phys. , vol.48 , pp. 056510
- Aoyama, H.¹ Tanaka, Y.² Tawarayama, K.³ Arisawa, Y.⁴ Tanaka, T.⁵ Mori, I.⁶

18
- 24644487718
- F. M. Schellenberg, J. Word, and O. Toublan: Proc. SPIE 5751 (2005) 320.
- (2005) Proc. SPIE , vol.5751 , pp. 320
- Schellenberg, F.M.¹ Word, J.² Toublan, O.³

19
- 44149102934
- I. Kim, A. Myers, L. S. Melvin III, B. Ward, G. F. Lorusso, R. Jonckheere, A. M. Goethals, and K. Ronse: Microelectron. Eng. 85 (2008) 738.
- (2008) Microelectron. Eng. , vol.85 , pp. 738
- Kim, I.¹ Myers, A.² Melvin III, L.S.³ Ward, B.⁴ Lorusso, G.F.⁵ Jonckheere, R.⁶ Goethals, A.M.⁷ Ronse, K.⁸

20
- 70349923607
- G. F. Lorusso, F. V. Roey, E. Hendrickx, G. Fenger, M. Lam, C. Zuniga, M. Habib, H. Diab, and J. Word: J. Micro/Nanolithogr. MEMS MOEMS 8 (2009) 041505.
- (2009) J. Micro/Nanolithogr. MEMS MOEMS , vol.8 , pp. 041505
- Lorusso, G.F.¹ Roey, F.V.² Hendrickx, E.³ Fenger, G.⁴ Lam, M.⁵ Zuniga, C.⁶ Habib, M.⁷ Diab, H.⁸ Word, J.⁹

21
- 77955328299
- J. Lee, K. Song, C. Kim, Y. Kim, and O. Kim: Jpn. J. Appl. Phys. 49 (2010) 06GD09.
- (2010) Jpn. J. Appl. Phys. , vol.49
- Lee, J.¹ Song, K.² Kim, C.³ Kim, Y.⁴ Kim, O.⁵

22
- 77953414507
- C. Lim, J. Park, J. Moon, S. Koo, Y. Hyun, H. S. Kim, D. Yim, and S. Park: Proc. SPIE 7636 (2010) 76362B.
- (2010) Proc. SPIE , vol.7636
- Lim, C.¹ Park, J.² Moon, J.³ Koo, S.⁴ Hyun, Y.⁵ Kim, H.S.⁶ Yim, D.⁷ Park, S.⁸

23
- 77953516070
- L. Zavyalova, I. Su, S. Jang, J. Cobb, B. Ward, J. Sorensen, H. Song, W. Gao, K. Lucas, G. F. Lorusso, and E. Hendrickx: Proc. SPIE 7636 (2010) 763627.
- (2010) Proc. SPIE , vol.7636 , pp. 763627
- Zavyalova, L.¹ Su, I.² Jang, S.³ Cobb, J.⁴ Ward, B.⁵ Sorensen, J.⁶ Song, H.⁷ Gao, W.⁸ Lucas, K.⁹ Lorusso, G.F.¹⁰ Hendrickx, E.¹¹

24
- 77953395387
- S. A. Goerge, P. P. Naulleau, C. D. Kemp, P. E. Denham, and S. Rekawa: Proc. SPIE 7636 (2010) 763626.
- (2010) Proc. SPIE , vol.7636 , pp. 763626
- Goerge, S.A.¹ Naulleau, P.P.² Kemp, C.D.³ Denham, P.E.⁴ Rekawa, S.⁵

25
- 33845270454
- T. G. Kim, B. H. Kim, I. Kang, Y. Chung, J. Ahn, S. Y. Lee, I. Park, C. Y. Kim, and N. Lee: J. Vac. Sci. Technol. B 24 (2006) 2820.
- (2006) J. Vac. Sci. Technol. B , vol.24 , pp. 2820
- Kim, T.G.¹ Kim, B.H.² Kang, I.³ Chung, Y.⁴ Ahn, J.⁵ Lee, S.Y.⁶ Park, I.⁷ Kim, C.Y.⁸ Lee, N.⁹

26
- 79957969029
- G. F. Lorusso, N. Davydova, M. Eurlings, C. Kaya, Y. Peng, K. Feenstra, T. H. Fedynyshyn, O. Natt, P. Huber, C. Zaczek, S. Young, P. Graeupner, and E. Hendrickx: Proc. SPIE 7969 (2011) 79692O.
- (2011) Proc. SPIE , vol.7969
- Lorusso, G.F.¹ Davydova, N.² Eurlings, M.³ Kaya, C.⁴ Peng, Y.⁵ Feenstra, K.⁶ Fedynyshyn, T.H.⁷ Natt, O.⁸ Huber, P.⁹ Zaczek, C.¹⁰ Young, S.¹¹ Graeupner, P.¹² Hendrickx, E.¹³

27
- 70349935008
- S. A. George, P. P. Naulleau, S. Rekawa, E. Gullikson, and C. D. Kemp: J. Micro/Nanolithogr. MEMS MOEMS 8 (2009) 041502.
- (2009) J. Micro/Nanolithogr. MEMS MOEMS , vol.8 , pp. 041502
- George, S.A.¹ Naulleau, P.P.² Rekawa, S.³ Gullikson, E.⁴ Kemp, C.D.⁵

28
- 77953433300
- Y. Arisawa, H. Aoyama, T. Uno, and T. Tanaka: Proc. SPIE 7636 (2010) 763618.
- (2010) Proc. SPIE , vol.7636 , pp. 763618
- Arisawa, Y.¹ Aoyama, H.² Uno, T.³ Tanaka, T.⁴

29
- 77953454504
- R. Inanami, H. Mashita, T. Takaki, T. Kotani, S. Kyoh, and S. Tanaka: Proc. SPIE 7636 (2010) 763616.
- (2010) Proc. SPIE , vol.7636 , pp. 763616
- Inanami, R.¹ Mashita, H.² Takaki, T.³ Kotani, T.⁴ Kyoh, S.⁵ Tanaka, S.⁶

30
- 77953455087
- T. Miura, K. Murakami, H. Kawai, Y. Kohama, K. Morita, K. Hada, and Y. Ohkubo: Proc. SPIE 7636 (2010) 76361G.
- (2010) Proc. SPIE , vol.7636
- Miura, T.¹ Murakami, K.² Kawai, H.³ Kohama, Y.⁴ Morita, K.⁵ Hada, K.⁶ Ohkubo, Y.⁷

31
- 77953383895
- M. Lowisch, P. Kuerz, H. Mann, O. Natt, and B. Thuering: Proc. SPIE 7636 (2010) 763603.
- (2010) Proc. SPIE , vol.7636 , pp. 763603
- Lowisch, M.¹ Kuerz, P.² Mann, H.³ Natt, O.⁴ Thuering, B.⁵

32
- 67149091232
- J. Park, Y. Hyun, C. Lim, T. Eom, S. Koo, S. Park, S. Kim, K. Ban, H. Yang, C. Oh, B. Nam, C. Kim, H. Kim, S. Moon, and S. Park: Proc. SPIE 7271 (2009) 72711G.
- (2009) Proc. SPIE , vol.7271
- Park, J.¹ Hyun, Y.² Lim, C.³ Eom, T.⁴ Koo, S.⁵ Park, S.⁶ Kim, S.⁷ Ban, K.⁸ Yang, H.⁹ Oh, C.¹⁰ Nam, B.¹¹ Kim, C.¹² Kim, H.¹³ Moon, S.¹⁴ Park, S.¹⁵

33
- 77954407631
- Y. Nakajima, K. Kasa, T. Sato, M. Asano, S. Kyoh, and H. Mizuno: Proc. SPIE 7748 (2010) 774824.
- (2010) Proc. SPIE , vol.7748 , pp. 774824
- Nakajima, Y.¹ Kasa, K.² Sato, T.³ Asano, M.⁴ Kyoh, S.⁵ Mizuno, H.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.