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Volumn 7636, Issue , 2010, Pages
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Mask roughness and its implications for LER at the 22- and 16nm nodes
a a b |
Author keywords
extreme ultraviolet; line edge roughness; lithography; multilayer; photomask; speckle; surface roughness
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Indexed keywords
CAPPING LAYER;
CURRENT CAPABILITY;
EXTREME ULTRAVIOLET;
EXTREME ULTRAVIOLETS;
LINE EDGE ROUGHNESS;
MASK ABSORBER;
MASK-ROUGHNESS;
MODELING RESULTS;
RANDOM-PHASE;
REFLECTED BEAM;
LITHOGRAPHY;
METAL ANALYSIS;
MULTILAYERS;
PHOTORESISTS;
RUTHENIUM;
SPECIFICATIONS;
SPECKLE;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
ROUGHNESS MEASUREMENT;
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EID: 77953395387
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.851561 Document Type: Conference Paper |
Times cited : (14)
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References (5)
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