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Volumn 7636, Issue , 2010, Pages

Mask roughness and its implications for LER at the 22- and 16nm nodes

Author keywords

extreme ultraviolet; line edge roughness; lithography; multilayer; photomask; speckle; surface roughness

Indexed keywords

CAPPING LAYER; CURRENT CAPABILITY; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; LINE EDGE ROUGHNESS; MASK ABSORBER; MASK-ROUGHNESS; MODELING RESULTS; RANDOM-PHASE; REFLECTED BEAM;

EID: 77953395387     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.851561     Document Type: Conference Paper
Times cited : (14)

References (5)
  • 1
    • 0041592534 scopus 로고    scopus 로고
    • The line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization
    • P. Naulleau and G. Gallatin, "The line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization," Appl. Opt. 42, 3390-3397 (2003).
    • (2003) Appl. Opt. , vol.42 , pp. 3390-3397
    • Naulleau, P.1    Gallatin, G.2
  • 2
    • 0032654746 scopus 로고    scopus 로고
    • Effects of mask roughness and condenser scattering in EUVL systems
    • N. Beaudry, T. Milster, "Effects of mask roughness and condenser scattering in EUVL systems," Proc. SPIE. 3676, 653-662 (1999).
    • (1999) Proc. SPIE. , vol.3676 , pp. 653-662
    • Beaudry, N.1    Milster, T.2
  • 3
    • 3142692472 scopus 로고    scopus 로고
    • The relevance of mask-roughness-induced printed line-edge roughness in recent and future EUV lithography tests
    • P. Naulleau, "The relevance of mask-roughness-induced printed line-edge roughness in recent and future EUV lithography tests," Appl. Opt. 43, 4025-4032 (2004).
    • (2004) Appl. Opt. , vol.43 , pp. 4025-4032
    • Naulleau, P.1
  • 4
    • 69949154613 scopus 로고    scopus 로고
    • Implications of image plane line-edge roughness requirements on extreme ultraviolet mask specifications
    • P. Naulleau and S. George, "Implications of image plane line-edge roughness requirements on extreme ultraviolet mask specifications," Proc. SPIE 7379, 73790O-73790O-11 (2009).
    • (2009) Proc. SPIE , vol.7379
    • Naulleau, P.1    George, S.2
  • 5
    • 77953442881 scopus 로고    scopus 로고
    • http://www.itrs.net/


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.