Effective-exposure-dose monitoring technique in EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7748, Issue , 2010, Pages

  Nakajima, Yumi ^a   Kasa, Kentaro ^a   Sato, Takashi ^a   Aasano, Masafumi ^a   Kyoh, Suigen ^a   Mizuno, Hiroyuki ^b  

^a TOSHIBA CORPORATION   (Japan)

^b Toshiba America Inc   (United States)

Author keywords

CD control; Effective dose monitor; Euv lithography; Shadowing effect

Indexed keywords

CD CONTROL; DEFOCUS; DOSE VARIATIONS; EFFECTIVE DOSE; EUV LITHOGRAPHY; EXPOSURE DOSE; KRF LITHOGRAPHY; LITHOGRAPHY TOOLS; MONITORING TECHNIQUES; OPTICAL LITHOGRAPHY; SHADOWING EFFECTS; STRINGENT REQUIREMENT; TEST PATTERN;

DATA STORAGE EQUIPMENT; EXTREME ULTRAVIOLET LITHOGRAPHY; KRYPTON; MONITORING;

LITHOGRAPHY;

EID: 77954407631     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.868924     Document Type: Conference Paper

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