EUV lithography program at IMEC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Goethals, Anne Marie ^a   Jonckheere, Rik ^a   Lorusso, Gian Francesco ^a   Hermans, Jan ^a   Van Roey, Frieda ^a   Myers, Alan ^b   Chandhok, Manish ^b   Kim, Insung ^c   Niroomand, Ardavan ^d   Iwamoto, Fumio ^e   Stepanenko, Nikolay ^f   Gronheid, Roel ^a   Baudemprez, Bart ^a   Ronse, Kurt ^a  

^a IMEC   (Belgium)

^b INTEL CORPORATION   (United States)

^c SAMSUNG Electronics   (South Korea)

^d MICRON TECHNOLOGY INC   (United States)

^e PANASONIC CORPORATION   (Japan)

^f Matsushita Electric Industrial CoLtd ^*  (Germany)

Author keywords

Defect printability; EUV lithography; EUV resists EUV reticles; Flare mitigation; Shadowing effect

Indexed keywords

DEFECT PRINTABILITY; FIELD SCANNERS; FLARE MITIGATION; INTERFERENCE LITHOGRAPHY;

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE INTERFERENCE; PROJECT MANAGEMENT;

LITHOGRAPHY;

EID: 35148825532     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.710798     Document Type: Conference Paper

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