Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: Predictions and experiments

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Lorusso, Gian F ^a   Davydova, Natalia ^b   Eurlings, Mark ^b   Kaya, Cemil ^b   Peng, Yue ^b   Feenstra, Kees ^b   Fedynyshyn, Theodore H ^c   Natt, Oliver ^d   Huber, Peter ^d   Zaczek, Christoph ^d   Young, Stuart ^b   Graeupner, Paul ^d   Hendrickx, Eric ^a  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^d CARL ZEISS SMT AG   (Germany)

Author keywords

EUV; EUVL; Out of Band

Indexed keywords

13.5 NM; AT-WAVELENGTH; BROAD SPECTRUM; DEEP ULTRAVIOLET; DISCHARGE-PRODUCED PLASMAS; DUV WAVELENGTH; EUV; EUVL; EXPERIMENTAL APPROACHES; EXTREME ULTRAVIOLET; IMAGING PERFORMANCE; IN-SITU; INPUT PARAMETER; MODELING PREDICTIONS; OUT-OF-BAND; REFLECTIVITY MEASUREMENTS; WAFER LEVEL;

ALUMINUM; ELECTRIC DISCHARGES; EXTREME ULTRAVIOLET LITHOGRAPHY; FORECASTING; LASER PRODUCED PLASMAS; LIGHT TRANSMISSION; OPTICAL DESIGN; OPTICAL SYSTEMS; PHOTORESISTS; REFLECTION;

LITHOGRAPHY;

EID: 79957969029     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879381     Document Type: Conference Paper

References (4)

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2. Yoshioka, M., Teramoto, Y., Jonkers, J., Schuermann, M. C., Apetz, R., Kilian, V., Corthout, M., "Tin DPP source collector module(SoCoMo) ready for integration into Beta Scanner" to be published, SPIE Advanced Lithography, (2011).
3. Lorusso, G. F., Van Roey, F., Hendrickx, E., Fenger, G., Lam, M., Zuniga, C., Habib, M., Diab, H., Word, J., "Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration" Journal of Micro/Nanolithography, MEMS, and MOEMS, 8, 4, (2009).
4. Fomenkov, I. V., Ershov, A. I., Partlo, W. N., Myers, D. W., Brown, D., Sandstrom, R. L., La Fontaine, B., Bykanov, A. N., Vaschenko, G. O., Khodykin, O. V., Böwering, N. R., Das, P., Fleurov, V., Zhang, K., Srivastava, S. N., Ahmad, I., Rajyaguru, C., De Dea, S., Hou, R., R., Dunstan, W., J., Baumgart, P., Isihara, T., Simmons, R., Jacques, R., Bergstedt, R., Brandt, D. C., "Laser Produced Plasma EUV Source for HVM" Extreme Ultraviolet Lithography Symposium, Kobe, (2010).