Evaluation of shadowing and flare effect for EUV tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Moon, James ^a   Kim, Cheol Kyun ^a   Nam, Byoung Sub ^a   Nam, Byoung Ho ^a   Hyun, Yoon Suk ^a   Kim, Suk Kyun ^a   Lim, Chang Moon ^a   Kim, Yong Dae ^a   Kim, Mun Sik ^a   Choi, Yong Kyoo ^a   Kim, Chang Reol ^a   Yim, Donggyu ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

EUVL; Flare; Mask; OPC; Photo lithography; RET; Shadowing

Indexed keywords

EUVL; FLARE; OPC; RET; SHADOWING;

LITHOGRAPHY; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149127143     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814364     Document Type: Conference Paper

References (3)

1. Rik Jonckheere et al, Full field EUV lithography turning into a reality at IMEC Proc. SPIE 6607, 66070H (2007)
2. Christof G. Krautschik et al, Impact of EUV light scatter on CD control as a result of mask density changes Proc.SPIE 4688, 289, 2002
3. M. Sugawara et al., J. Vac. Sei. Tech. B 21, 2701 ( 2003 )