Novel absorber stack for minimizing shadow effect in extreme ultraviolet mask

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2820-2823

  Kim, Tae Geun ^a   Kim, Byung Hun ^a   Kang, In Yong ^a   Chung, Yong Chae ^a   Ahn, Jinho ^a   Lee, Seung Yoon ^a   Park, In Sung ^a   Kim, Chung Yong ^a   Lee, Nae Eung ^b  

^a Hanyang University   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ANTIREFLECTION COATINGS; COMPUTER SIMULATION; LITHOGRAPHY; OPTIMIZATION; REFLECTION; ULTRAVIOLET DEVICES;

OPTICAL SIMULATION; PATTERN FIDELITY; SHADOW EFFECTS; ULTRAVIOLET MASKS;

MASKS;

EID: 33845270454     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2393295     Document Type: Article

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