Flare mitigation strategies in extreme ultraviolet lithography

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 738-743

  Kim, Insung ^a   Myers, Alan ^b   III, Lawrence S Melvin ^c   Ward, Brian ^c   Lorusso, Gian Francesco ^d   Jonckheere, Rik ^d   Goethals, Anne Marie ^d   Ronse, Kurt ^d  

^a SAMSUNG Electronics   (South Korea)

^b INTEL CORPORATION   (United States)

^c SYNOPSYS INC   (United States)

^d IMEC   (Belgium)

Author keywords

EUVL; Flare; Optical proximity correction

Indexed keywords

ERROR CORRECTION; LOGIC PROGRAMMING; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); FLARE MITIGATION STRATEGIES; OPTICAL PROXIMITY CORRECTION;

IMAGE QUALITY;

EID: 44149102934     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.098     Document Type: Article

References (11)

1. Krautschik C., Ito M., Nishiyama I., and Okazaki S. Proc. SPIE 4688 (2002) 289
2. Lee P Naulleau S.H., Krautschik C., Chandhok M., Chapman H., O'Connell D.J., and Goldstein M. Proc. SPIE 5037 (2003) 103
3. Lee S.H., Chandhok M., Krautschik C., and Goldstein M. Proc. SPIE 5374 (2004) 818
4. Chandhok M., Lee S.H., Krautschik C., Zhang G., Rice B.J., Panning E., Goldstein M., Bristol R., Stivers A.R., and Shell M. Proc. SPIE 5374 (2004) 854
5. Chandhok M., Lee S.H., and Bacuita T. J. Vac. Sci. Techol. B 22 (2004) 2966
6. Lee S.H., Chandhok M., Panning E.M., Roberts J.M., and Cao H.B. Proc. SPIE 5671 (2005) 293
7. Lorusso G.F., Goethals A.M., Jonckheere R., Ronse K., Myers A.M., Kim I., Niromaand A., Iwamoto F., and Ritter D. J. Vac. Sci. Technol. B 25 6 (2007) 1
8. Goethals A.M., Jonckheere R., Lorusso G.F., Hermans J., and Van Roey F. Proc. SPIE 3838 (2007) 651709
9. Chandhok M., Lee S.H., Krautschik C., Rice B.J., Panning E., Goldstein M., and Shell M. Proc. SPIE 5374 (2004) 86
10. Schellenberg F.M., Word J., and Toublan O. Proc. SPIE 5751 (2005) 320
11. Krautschik C., Chandhok M., Zhang G., Lee S., Goldstein M., Panning E., Rice B., Bristol R., and Singh V. Proc. SPIE 5037 (2003) 58