Study of practical TAT reduction approaches for EUV flare correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Inanami, Ryoichi ^a   Mashita, Hiromitsu ^a   Takaki, Takamasa ^a   Kotani, Toshiya ^a   Kyoh, Suigen ^a   Tanaka, Satoshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

EUVL; flare correction; flare map; flare PSF

Indexed keywords

CALCULATION TIME; EUVL; MAKING PROCESS; MASK PATTERNS; POINT-SPREAD FUNCTION;

MASKS;

OPTICAL TRANSFER FUNCTION;

EID: 77953454504     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846326     Document Type: Conference Paper

References (3)

1. Krautschik, C., Chandhok, M., Zhang, G., Lee, S., Goldsrein, M., Panning, E., Rice, B., Bristol., R., Singh, V., "Implementing flare compensation for EUV masks through localized mask CD resizing", Proc. SPIE 5037, 58-68 (2003).
2. Arisawa, H.Aoyama, Y., Uno, T., Tanaka, T., Mori, I., "Flare compensation for EUVL", Proc. SPIE 7271, 727145 (2009)
3. Schellenberg, F., M., Word, J., Toublan, O., "Layout Compensation for EUV Flare", Proc. SPIE 5751, 320-320 (2005)