EUV patterning characterization using a 3D mask simulation and field EUV scanner

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Park, Jun Taek ^a   Hyun, Yoon Suk ^a   Lim, Chang Moon ^a   Eom, Tae Seung ^a   Koo, Sunyoung ^a   Park, Sarohan ^a   Kim, Suk Kyun ^a   Ban, Kuen Do ^a   Yang, Hyun Jo ^a   Oh, Chang Il ^a   Nam, Byoung Ho ^a   Kim, Chang Reol ^a   Kim, HyeongSoo ^a   Moon, Seung Chan ^a   Park, Sungki ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

EUV lithography; Shadowing effect

Indexed keywords

3D-MASK SIMULATION; ABSORBER LAYERS; CD VARIATION; CORRECTION METHOD; DUV SCANNERS; EUV LITHOGRAPHY; EUV SOURCE; EXPOSURE SYSTEM; LINE-AND-SPACE PATTERNS; OBLIQUE INCIDENCE; OFF-AXIS; PATTERN ORIENTATION; PROCESS WINDOW; REFLECTIVE OPTICS; REFRACTIVE SYSTEMS; SHADOWING EFFECT; SHADOWING EFFECTS; SHIFT-AND; TECHNOLOGY NODES;

LIGHT SOURCES; MASKS; SCANNING; TECHNOLOGY; THREE DIMENSIONAL; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149091232     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814407     Document Type: Conference Paper

References (6)

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6. Panoramic EM suite is trade mark of Panoramic Technologies.