Flare modeling and calculation on EUV optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Shiraishi, M ^a   Oshino, T ^a   Murakami, K ^a   Chiba, H ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

EUV; Flare; OPC; PSD; PSF; scatter; TIS

Indexed keywords

BRIGHT FIELDS; DOMAIN CONVERSION; ENERGY LOSS; EUV OPTICS; IMAGE INTENSITIES; ON-WAFER; POINT-SPREAD FUNCTIONS; SCATTERED LIGHT; TOTAL INTEGRATED SCATTERS;

ARTIFICIAL INTELLIGENCE; ENERGY DISSIPATION; INTEGRATION; LIGHT; LITHOGRAPHY; MIRRORS; POWER SPECTRAL DENSITY; SURFACE ROUGHNESS;

OPTICAL TRANSFER FUNCTION;

EID: 77953475336     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846472     Document Type: Conference Paper

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