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Volumn 25, Issue 6, 2007, Pages 2127-2131
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Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy
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Author keywords
[No Author keywords available]
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Indexed keywords
FLARE MITIGATION STRATEGY;
MASK PROJECTS;
MICROELECTRONICS;
PROBLEM SOLVING;
PRODUCTION;
PROJECT MANAGEMENT;
TECHNOLOGY;
EXTREME ULTRAVIOLET LITHOGRAPHY;
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EID: 37149034956
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2781516 Document Type: Article |
Times cited : (39)
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References (14)
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