Impact of EUV light scatter on CD control as a result of mask density changes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 289-301

  Krautschik, Christof ^a   Ito, Masaaki ^a   Nishiyama, Iwao ^a   Okazaki, Shinji ^a  

^a NTT CORPORATION   (Japan)

Author keywords

CD control; Flare; Light scatter; Mask density change; Mirror surface roughness; Power Spectral Density (PSD)

Indexed keywords

FREQUENCIES; LIGHT SCATTERING; MASKS; SURFACE ROUGHNESS;

POWER SPECTRAL DENSITY (PSD);

ULTRAVIOLET RADIATION;

EID: 0036381345     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472302     Document Type: Conference Paper

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