Nikon EUVL development progress update

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Miura, Takaharu ^a   Murakami, Katsuhiko ^a   Kawai, Hidemi ^a   Kohama, Yoshiaki ^a   Morita, Kenji ^a   Hada, Kazunari ^a   Ohkubo, Yukiharu ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

EUV exposure tool; EUVL; Extreme Ultra Violet Lithography; Projection Optics

Indexed keywords

COLLABORATIVE WORK; EUV LITHOGRAPHY; EXPOSURE TOOL; FULL FIELD EXPOSURE TOOLS; HIGH NA; IMAGING CAPABILITIES; OFF-AXIS ILLUMINATION; PROCESS DEVELOPMENT; PROJECTION OPTICS; RESOLUTION CAPABILITY; TEST CHIPS; THROUGHPUT CAPABILITY; TOOL DEVELOPMENT; UNIQUE FEATURES; VARIABLE ILLUMINATION;

EXPOSURE METERS; OPTICS;

LITHOGRAPHY;

EID: 77953455087     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846459     Document Type: Conference Paper

References (11)

1. T. Miura, K. Murakami, H Kawai, Y. Kohama, K. Morita, K. Hada, Y. Ohkubo, "Nikon EUVL development progress update", Proc. SPIE 7271, 72711X (2009).
2. K. Murakami, T. Oshino, H. Kondo, M. Shiraishi, H. Chiba, H. Komatsuda, K. Nomura and J. Nishikawa, "Development progress of optics for EUVL at Nikon", Proc. SPIE 7271, 72711Z (2009)
3. K. Tawarayama, H. Aoyama, S. Magoshi, Y. Tanaka, S. Shirai, H. Tanaka, "Recent progress of EUV Full Field Exposure Tool in Selete", Proc. SPIE 7271, 727118 (2009).
4. G. Vandentop, M. Chandhk, E. Putna, T. Younkin, J. Clarke, S. Carson, A. Myers, K. Leeson, G. Zhang, T. Liang, and T. Murachi, "Demonstration of full field patterning of 32nm test chips using EUVL", Proc. SPIE 7271, 727116 (2009)
5. M. Amemiya, K. Ota, T. Taguchi, O. Suga, "Experimental Study of Particle-free Mask Handling", Proc. SPIE 7271, 72713G (2009).
6. th International Symposium on Extreme Ultraviolet Lithography, Prague, Czech Republic (2009).
7. th International Symposium on Extreme Ultraviolet Lithography, Prague, Czech Republic (2009).
8. th International Symposium on Extreme Ultraviolet Lithography, Prague, Czech Republic (2009).
9. th International Symposium on Extreme Ultraviolet Lithography, Prague, Czech Republic (2009).
10. th International Symposium on Extreme Ultraviolet Lithography, Prague, Czech Republic (2009).
11. th International Symposium on Extreme Ultraviolet Lithography, Prague, Czech Republic (2009).