Optics for EUV production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Lowisch, Martin ^a   Kuerz, Peter ^a   Mann, Hans Juergen ^a   Natt, Oliver ^a   Thuering, Bernd ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

EUVL; flare; metrology; optics

Indexed keywords

AT-WAVELENGTH; CARL ZEISS SMT; CURRENT STATUS; EUV OPTICS; EUVL; EXPOSURE TOOL; FLARE METROLOGY; FULL-FIELD; ILLUMINATION SYSTEM; OFF-AXIS ILLUMINATION; PARTIAL COHERENCE; TECHNOLOGY DEVELOPMENT;

DRILLING PLATFORMS; TECHNOLOGICAL FORECASTING;

PRODUCTION PLATFORMS;

EID: 77953383895     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848624     Document Type: Conference Paper

References (5)

1. For a summary see Proceedings of, 8th International Symposium on Extreme Ultraviolet Lithography, Prague (2009).
2. H. Meiling et al., "EUV System - Moving towards Production", SPIE Conference on emerging Lithographic Technologies, Vol. 7271 (2009).
3. Ch. Wagner et al., "EUV into production: update on ASML's NXE platform", SPIE Conference on Extreme Ultraviolet (EUV) Lithography, paper 7636-52 (2010).
4. M. Bienert et al., "Imaging budgets for EUV optics: ready for 22-nm node and beyond", SPIE Conference on Alternative Lithographic Technologies, Vol. 7271 (2009)
5. E. D. van Hattum et al., "High-reflectance multilayer coating technology for 3100-EUVL projection optics", SPIE Conference on Extreme Ultraviolet (EUV) Lithography, paper 7636-104 (2010)