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Volumn 7636, Issue , 2010, Pages

Practical flare compensation strategy for DRAM device

Author keywords

ADT; critical radius; DRAM; extreme UV; Flare; pattern density; PSF

Indexed keywords

COMPENSATION STRATEGY; COMPUTATIONAL TIME; CONVOLUTION INTEGRALS; CRITICAL RADIUS; DEVICE LAYOUT; DRAM DEVICES; EUV LITHOGRAPHY; EXTREME UV; LONG TAIL; MICRON RANGE; PATTERN DENSITY; POINT-SPREAD FUNCTION; PROJECTION OPTICS;

EID: 77953414507     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846509     Document Type: Conference Paper
Times cited : (1)

References (6)
  • 1
    • 3843087238 scopus 로고    scopus 로고
    • Determination of the flare specification and methods to meet the CD control requirements for the 32nm node using EUVL
    • M. Chandhok, Sang H. Lee, C. Krautschik, B. Ryce, E. Panning, M. Goldstein, and M. Shell, "Determination of the flare specification and methods to meet the CD control requirements for the 32nm node using EUVL" Proc. SPIE 5374, 86-95 (2004)
    • (2004) Proc. SPIE , vol.5374 , pp. 86-95
    • Chandhok, M.1    Lee, S.H.2    Krautschik, C.3    Ryce, B.4    Panning, E.5    Goldstein, M.6    Shell, M.7
  • 5
    • 0036416499 scopus 로고    scopus 로고
    • Intra-field CD variation by stray light from neighboring field
    • C.M. Lim, J. H. Song, S. S. Woo, K. S. Kwon, C. N. Ahn, and K. S. Shin, "Intra-field CD variation by stray light from neighboring field," Proc. SPIE 4691, 1412-1420 (2002)
    • (2002) Proc. SPIE , vol.4691 , pp. 1412-1420
    • Lim, C.M.1    Song, J.H.2    Woo, S.S.3    Kwon, K.S.4    Ahn, C.N.5    Shin, K.S.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.