Layout compensation for EUV flare

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 320-329

  Schellenberg, Franklin M ^a   Word, James ^a   Toublan, Olivier ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Data management; EUV; Flare; OPC; RET

Indexed keywords

COMPUTER AIDED SOFTWARE ENGINEERING; ERROR COMPENSATION; INTEGRATED CIRCUIT LAYOUT; SOFTWARE PROTOTYPING; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; FLARE CORRECTION TECHNIQUES; OPC; RET;

PHOTOLITHOGRAPHY;

EID: 24644487718     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599999     Document Type: Conference Paper

References (17)

1. nd Edition, and references therein (SPIE Press, Bellingham, WA, 2005), pp. 166-168.
2. J. Kirk, "Scattered light in photolithographic lenses", in Optical/Laser Microlithography VII, Proc. SPIE 2197, pp. 566-572 (1994).
3. Ch. Krautschik, M. Ito, I. Nishiyama, S. Okazaki, "Impact of EUV light scatter on CD control as a result of mask density changes", in Emerging Lithographic Technologies VI; Proc. SPIE 4688, pp 289-301 (2002).
4. S.H. Lee, P. Naulleau, Ch. Krautschik, M. Chandhok, H. Chapman, D.J O'Connell, M. Goldstein., "Lithographic flare measurements of EUV full-field projection optics", in Emerging Lithographic Technologies VII, Proc. SPIE 5037 pp. 103-111 (2003).
5. Ch. Krautschik, M. Chandhok, G. Zhang, S.H. Lee, M. Goldstein, E. Panning, B.J Rice, R. L Bristol, V. Singh. "Implementing flare compensation for EUV masks through localized mask CD resizing", in Emerging Lithographic Technologies VII; Proc. SPIE 5037, pp. 58-68 (2003).
6. M. Chandhok, S.H Lee, Ch. Krautschik, B.J Rice, E. Panning, M. Goldstein, M. Shell, "Determination of the flare specification and method to meet the CD control requirements for the 32 nm node using EUVL", in Emerging Lithographic Technologies VIII, Proc. SPIE 5374, pp. 86-95 (2004).
7. S.H. Lee, M. Chandhok, Ch. Krautschik, M. Goldstein "Anisotropic EUV Flare Measured in the Engineering Test Stand (ETS)" in Emerging Lithographic Technologies VIII; Proc. SPIE 5374, pp. 818-823 (2004).
8. M. Chandhok, S.H. Lee, Ch. Krautschik, B.J. Rice, E. Panning, M. Goldstein, M. Shell., "Determination of the flare specification and method to meet the CD control requirements for the 32 nm node using EUVL", in Emerging Lithographic Technologies VIII, Proc. SPIE 5374 pp. 86-95 (2004).
9. M. Chandhok, S.H. Lee, Ch. Krautschik, G. Zhang, B.J. Rice, M. Goldstein, E. Panning, R. Bristol, A.R. Stivers, M. Shell, "Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems", in Emerging Lithographic Technologies VIII, Proc. SPIE 5374 pp. 854-860 (2004).
10. M. Chandhok, S.H. Lee, T. Bacuita, "Effects of flare in extreme ultraviolet lithography: Learning from the engineering test stand", J. Vac. Sci. Technol. B 22, pp. 2966-2969 (2004).
11. S.H. Lee, M. Chandhok, E.M. Panning, J.M. Roberts and H.B. Cao, "Characterization of flare on Intel's EUV MET Tool, in Emerging Lithographic Technologies IX, Proc. SPIE 5671, paper 5671-31 (2005).
12. th Annual BACUS Symposium on Photomask Technology Proc SPIE 5567, pp. 700-710 (2004).
13. A.K.K. Wong, Resolution Enhancement Techniques in Optical Lithography (SPIE Press, Bellingham, WA, 2001), Ch. 4.
14. th Annual BACUS Symposium on Photomask Technology and Management Proc. SPIE 2621, pp 534-545 (1995).
15. Nicolas Cobb, Fast Optical and Process Correction Algorithms for Integrated Circuit Manufacturing, Ph.D. Dissertation, University of California at Berkeley, 1998.
16. B. Stine, D. Boning, J. Chung, L. Camilletti, F. Kruppa, E. Equi, W. Loh, S. Prasad, M. Muthukrishnan, D. Towery, M. Berman, A. Kapoor, "The physical and electrical effects of metal-fill patterning practices for oxide chemical-mechanical polishing processes", IEEE Trans. Electeon Devices 45, pp. 665-679 (1998).
17. K. Adam. A.R. Neureuther, "Domain decomposition methods for the rapid electromagnetic simulation of photomask scattering", J. Microlith. Microfab. Microsyst. 1, p. 253-269 (2002).