EUV lithography with the Alpha Demo Tools: Status and challenges

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Harned, Noreen ^a   Goethals, Mieke ^b   Groeneveld, Rogier ^c   Kuerz, Peter ^d   Lowisch, Martin ^d   Meijer, Henk ^c   Meiling, Hans ^c   Ronse, Kurt ^b   Ryan, James ^e   Tittnich, Michael ^e   Voorma, Harm Jan ^c   Zimmerman, John ^a   Mickan, Uwe ^c   Lok, Sjoerd ^c  

^a ASML US Inc   (United States)

^b IMEC   (Belgium)

^c ASML   (Netherlands)

^d CARL ZEISS SMT AG   (Germany)

^e STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

EUV lithography (EUVL); Optics; Resist; Reticle and wafer handling; Reticles; Tin (Sn) source; Wafer and reticle stages

Indexed keywords

NANOTECHNOLOGY; OPTICAL SYSTEMS; TECHNOLOGY TRANSFER; TIN; WAFER BONDING;

EUV LITHOGRAPHY (EUVL); RETICLE STAGES; RETICLES; WAFER HANDLING;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148888641     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712065     Document Type: Conference Paper

References (5)

1. H. Meiling, V. Banine, N. Harned, B. Blum, P. Kürz, and H.Meijer, "Development of the ASML EUV alpha demo tool", SPIE Symposium on Emerging Lithographic Technologies IX, Vol. 5751, (2005).
2. H. Meiling, H.Meijer, V.Banine, R.Moors, R.Groeneveld, H.J.Voorma, U.Mickan, B.Wolschrijn, B.Mertens, G.vanBaars, P. Kürz, and N.Harned, "First performance results of the ASML alpha demo tools", SPIE Symposium on Emerging Lithographic Technologies IX, Vol. 6151, (2006).
3. H. Meiling, V. Banine, P. Kürz, B. Blum, G.J. Heerens, and N. Harned, "The EUV Program at ASML: an update", SPIE Symposium on Emerging Lithographic Technologies VII, Vol. 5037, (2003).
4. H. Meiling, V. Banine, P. Kürz, and N. Harned, "Progress in the ASML EUV program", SPIE Symposium on Emerging Lithographic Technologies VIII, Vol. 5374, (2004).
5. H. Meiling, H. Meijer, V. Banine, R. Moors, R. Groeneveld, H.-J. Voorma, U. Mickan, B. Wolschrijn, B. Mertens, G. van Baars, P. Kürz, and N. Harned, "First performance results of the ASML EUV alpha demo tool", SPIE Symposium on Emerging Lithographic Technologies X (2006).