Synthesis of c-axis oriented AlN thin films on different substrates: A review

Materials Research Bulletin

Volumn 45, Issue 9, 2010, Pages 1039-1045

  Iriarte, G F ^a   Rodriguez J G ^a   Calle, F ^a  

^a UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

Author keywords

C. X ray diffraction

Indexed keywords

ALN; ALN THIN FILMS; ALUMINUM NITRIDE THIN FILMS; ALUMINUM TARGET; CRYSTALLOGRAPHIC ORIENTATIONS; CRYSTALLOGRAPHIC PROPERTIES; DEPOSITION PARAMETERS; DIFFERENT SUBSTRATES; LAYERED FILM STRUCTURES; PIEZOELECTRIC LAYERS; PULSED DC; ROCKING CURVES; SYNTHESIS PARAMETERS;

ALUMINUM; ALUMINUM COATINGS; DEPOSITION; NITRIDES; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY CRYSTALLOGRAPHY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAYS;

ALUMINUM NITRIDE;

EID: 77955558836     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2010.05.035     Document Type: Article

References (40)

1. S.S.A.H. Morkoc J. Vac. Sci. Technol. B 10 1992 1237
2. G. Carlotti, F.S. Hickernell, H.W. Liaw, L. Palmieri, G. Socino, and E. Verona Proc. IEEE Ultrason. Symp. 1995 353
3. A.N.B.A.F. Belyanin, L.L. Bouilov, and B.V. Spitsyn J. Chem. Vapor Depos. 5 1997 267
4. Iriarte IEEE Trans. Ultrason. Ferroelectr. Freq. Contr. 50 2003 1542
5. G. Bu, D. Ciplys, M. Shur, L.J. Schowalter, S. Schujman, and R. Gaska IEEE Trans. Ultrason. Ferroelectr. Freq. Contr. 53 2006 251
6. A. Artieda, and P. Muralt IEEE, 2007 Ultrasonics Symposium Proceedings, vols. 1-6 2007 p. 1164
7. R.S. Naik, J.J. Lutsky, R. Reif, C.G. Sodini, A. Becker, L. Fetter, H. Huggins, R. Miller, J. Pastalan, G. Rittenhouse, and Y.H. Wong IEEE Trans. Ultrason. Ferroelectr. Freq. Contr. 47 2000 292
8. F. Verjus, A. Fougerat, J. Rousseard, F. Le Cornec, S. Loiseau, and L. Valbin IEEE International Frequency Control Symposium, vols. 1 and 2 2008 p. 233
9. J. Bai, X. Huang, and M. Dudley Mater. Sci. Semicond. Process. 9 2006 180
10. M. Ishihara, T. Nakamura, F. Kokai, and Y. Koga Diamond Relat. Mater. 11 2002 408
11. Y. Huttel, H. Gomez, A. Cebollada, G. Armelles, and M.I. Alonso J. Cryst. Growth 242 2002 116
12. K. Kusaka, D. Taniguchi, T. Hanabusa, and K. Tominaga Vacuum 66 2002 441
13. N.W. Emanetoglu, G. Patounakis, S. Liang, C.R. Gorla, R. Wittstruck, and Y. Lu IEEE Trans. Ultrason. Ferroelectr. Freq. Contr. 48 2001 1389
14. P. Kirsch, M.B. Assouar, O. Elmazria, M. El Hakiki, V. Mortet, and P. Alnot IEEE Trans. Ultrason. Ferroelectr. Freq. Contr. 54 2007 1486
15. A. Benetti, D. Cannata, F. Di Pietrantonio, E. Verona, A. Generosi, B. Paci, and V.R. Albertini Thin Solid Films 497 2006 304
16. J. Ohta, H. Fujioka, M. Sumiya, M. Furusawa, M. Yoshimoto, H. Koinuma, and M. Oshima Proceedings of International Workshop on Nitride Semiconductors Tokyo, Japan 2000
17. E. Valcheva, J. Birch, P.O.A. Persson, S. Tungasmita, and L. Hultman J. Appl. Phys. 2006 100
18. Z. Vashaeia, T. Aikawaa, M. Ohtsukaa, H. Kobatakea, H. Fukuyamaa, S. Ikedab, and K. Takadab J. Cryst. Growth 311 2009 459 462
19. C. Hao, S. Yong, and H. Peter Thin Solid Films 434 2003 112 120
20. C. Hao, S. Yong, and H. Peter Surf. Coat. Technol. 166 2003 231 236
21. B. Wang, Y.N. Zhao, and Z. He Vacuum 48 1997 427 429
22. H. Lee, G. Kim, S. Hong, K. Lee, Y. Yong, C. Chun, and J. Lee Thin Solid Films 261 1995 148
23. J.S. Cherng, C.M. Lin, and T.Y. Chen Surf. Coat. Technol. 202 2008 5684 5687
24. W.J. Liu, S.-J. Wu, C.-M. Chen, Y.-C. Lai, and C.-H. Chuang J. Cryst. Growth 276 2005 525 533
25. M.B. Assouar, M. El Hakiki, O. Elmazria, P. Alnot, and C. Tiusan Diamond Relat. Mater. 132 2004 1111 1115
26. F. Engelmark, G. Fuentes, I.V. Kaardjiev, A. Harsta, U. Smith, and S. Berg J. Vac. Sci. Technol. A (Vac. Surf. Films) 18 2000 1609
27. G.F. Iriarte, F. Engelmark, and L. Katardjiev J. Mater. Res. 17 2002 1469
28. K. Sato, S. Umino, K. Tsubouchi, and N. Mikoshiba IEEE 1985 Ultrasonics Symposium, Proceedings (Cat. No. 85CH2209-5) New York, NY, USA 1985
29. G. Chung, and H. Hong J. Korean Phys. Soc. 55 2009 1446
30. J.X. Zhang, H. Cheng, Y.Z. Chen, A. Uddin, S. Yuan, S.J. Geng, and S. Zhang Surf. Coat. Technol. 198 2005 68
31. S. Saravanan, E.G. Keim, G.J.M. Krijnen, and M. Elwenspoek Microsc. Semicond. Mater. 107 2005 75
32. Iriarte J. Mater. Res. 18 2003 1733
33. H.C. Barshilia, B. Deepthi, and K.S. Rajam Thin Solid Films 516 2008 4168
34. J. Lee, D. Cho, D. Kim, C. Park, and J. Park Thin Solid Films 516 2007 475
35. Kar, Mukherjee, Bose, and Tuli J. Mater. Sci. Mater. Electron. 19 2008 261
36. Y.Z. You, and D. Kim Thin Solid Films 515 2007 2860
37. Chen, Wang, Wang, Xing, Song, and Zhu J. Cryst. Growth 283 2005 315
38. S.M. Tanner, and V.V. Felmetsger J. Vac. Sci. Technol. A 28 2010 69
39. M. Dubois, and P. Muralt J. Appl. Phys. 89 2001 6389
40. A. Rajamani, R. Beresford, and B.W. Sheldon Appl. Phys. Lett. 79 2001 3776