Measurements of the bulk, c-axis electromechanical coupling constant as a function of a1n film quality

IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control

Volumn 47, Issue 1, 2000, Pages 292-296

  Naik, Rajan S ^a   Lutsky, Joseph J ^a   Reif, Rafaël ^a   Sodini, Charles G ^b   Becker, Andy ^b   Fetter, ^b   Huggins, Harold ^b   Miller, Ronald ^b   Pastalan, John ^b   Rittenhouse, Gee ^b   Wong, Yiu Huen ^b  

^a INTEL CORPORATION   (United States)

^b NATIONAL SEMICONDUCTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; BANDPASS FILTERS; CRYSTAL RESONATORS; ELECTROMECHANICAL FILTERS; NITRIDES; PIEZOELECTRIC MATERIALS; POLYCRYSTALLINE MATERIALS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ALUMINUM NITRIDE; ELECTROMECHANICAL COUPLING CONSTANTS;

DIELECTRIC FILMS;

EID: 0033887359     PISSN: 08853010     EISSN: None     Source Type: Journal    
DOI: 10.1109/58.818773     Document Type: Article

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