Microstructure evolution of AIN films deposited under various pressures by RF reactive sputtering

Surface and Coatings Technology

Volumn 166, Issue 2-3, 2003, Pages 231-236

  Cheng, Hao ^a   Sun, Yong ^a   Hing, Peter ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

AIN film; Preferred orientation; RF sputtering; Selected area diffraction; X ray diffraction

Indexed keywords

ALUMINUM NITRIDE; ELECTRON DIFFRACTION; MAGNETRON SPUTTERING; MICROSTRUCTURE; PRESSURE EFFECTS; SILICON; SPUTTER DEPOSITION; X RAY DIFFRACTION;

SELECTED AREA ELECTRON DIFFRACTION (SAD);

THIN FILMS;

X-RAY;

EID: 0037464310     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00771-5     Document Type: Article

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