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Volumn 276, Issue 3-4, 2005, Pages 525-533

Microstructural evolution and formation of highly c-axis-oriented aluminum nitride films by reactively magnetron sputtering deposition

(5) Liu, Wen Jen a Wu, Shih Jeh a Chen, Chih Min b Lai, Yin Chieh b Chuang, Chun Han a

a I SHOU UNIVERSITY (Taiwan)

b NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

A1. Growth mechanism; A1. Transmission electron microscopy; A3. Reactive sputtering; B2. Aluminum nitride

Indexed keywords

ACOUSTIC SURFACE WAVE DEVICES; ALUMINUM NITRIDE; MAGNETRON SPUTTERING; MICROSTRUCTURE; PIEZOELECTRICITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS LAYERS; GROWTH MECHANISM; REACTIVE SPUTTERING; TRANSITION LAYERS;

THIN FILMS;

EID: 15344348444 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2004.11.421 Document Type: Article

Times cited : (39)

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